Effect of hydrogen on the growth of thin hydrogenated amorphous carbon films from thermal energy radicals

E. Neyts, A. Bogaerts, M.C.M. Sanden, van de

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Mol. dynamics simulations have been performed to investigate the growth of thin hydrogenated amorphous carbon (a-C:H) films from radical species with thermal energy. It is found that the incorporation of H into the film increases the mass d. The max. mass d. is reached for a H flux of about 10%. The atom d. of the films reaches a max. at a H flux of about 30%. It is shown that these effects are a result of the change in microstructure of the films, including a H-induced sp to sp2 to sp3 shift. These results are important for thin a-C:H film deposition techniques where chemisorption of radical species is the main growth mechanism. [on SciFinder (R)]
Originele taal-2Engels
Artikelnummer141922
Pagina's (van-tot)141922-1/3
Aantal pagina's3
TijdschriftApplied Physics Letters
Volume88
Nummer van het tijdschrift14
DOI's
StatusGepubliceerd - 2006

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