ECS Transactions: Preface

F. Roozeboom; H. Iwai; D. L. Kwong; M.C. Öztürk; P. J. Timans; V. Narayanan; E. P. Gusev

ECS Transactions: Preface

F. Roozeboom, H. Iwai, D. L. Kwong, M.C. Öztürk, P. J. Timans, V. Narayanan, E. P. Gusev

Plasma & Materials Processing

Onderzoeksoutput: Bijdrage aan tijdschrift › Editorial › Academic › peer review

Originele taal-2	Engels
Tijdschrift	ECS Transactions
Volume	35
Nummer van het tijdschrift	2
Status	Gepubliceerd - 1 aug. 2011
Evenement	Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications - 219th ECS Meeting - Montreal, QC, Canada Duur: 2 mei 2011 → 4 mei 2011

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title = "ECS Transactions: Preface",

author = "F. Roozeboom and H. Iwai and Kwong, {D. L.} and M.C. {\"O}zt{\"u}rk and Timans, {P. J.} and V. Narayanan and Gusev, {E. P.}",

year = "2011",

month = aug,

day = "1",

language = "English",

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journal = "ECS Transactions",

issn = "1938-5862",

publisher = "Electrochemical Society, Inc.",

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note = "Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications - 219th ECS Meeting ; Conference date: 02-05-2011 Through 04-05-2011",

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TY - JOUR

T1 - ECS Transactions

T2 - Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications - 219th ECS Meeting

AU - Roozeboom, F.

AU - Iwai, H.

AU - Kwong, D. L.

AU - Öztürk, M.C.

AU - Timans, P. J.

AU - Narayanan, V.

AU - Gusev, E. P.

PY - 2011/8/1

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M3 - Editorial

AN - SCOPUS:79960831036

SN - 1938-5862

VL - 35

JO - ECS Transactions

JF - ECS Transactions

IS - 2

Y2 - 2 May 2011 through 4 May 2011

ER -