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Dynamic behavior of thermionic dispenser cathodes under ion bombardment

  • H.M.R. Cortenraad
  • , A.W. Denier van der Gon
  • , H.H. Brongersma
  • , G. Gärtner
  • , D. Raasch
  • , A. Manenschijn

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

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Samenvatting

We have investigated the surface coverage and electron emission of thermionic dispenser cathodes during 3 keV Ar+ ion bombardment, thereby simulating the bombardment of the cathodes by residual gases that takes place in cathode-ray tubes as used in television sets. During the ion bombardment at the operating temperature of 1030¿°C, a dynamic equilibrium is established between the sputter removal and resupply mechanisms of the Ba and O atoms that form the dipole layer on the cathode substrate. We demonstrated that the performance of the cathodes under ion bombardment is governed by the O removal and resupply rates. It was found that the Ba resupply rate is almost an order of magnitude higher than the O resupply rate, but that the Ba can only be present on the surface bound to O atoms. Therefore, the Ba/O ratio is approximately equal to unity during the ion bombardment. Based on the investigations of the removal and resupply processes, we proposed a model that accurately describes the surface coverage and electron emission during the ion bombardment, including the dependence of the ion flux and cathode temperature.
Originele taal-2Engels
Pagina's (van-tot)4354-4364
TijdschriftJournal of Applied Physics
Volume89
Nummer van het tijdschrift8
DOI's
StatusGepubliceerd - 2001

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