Samenvatting
The thin-film directed self-assembly of molecular building blocks into oriented nanostructure arrays enables next-generation lithography at the sub-5 nm scale. Currently, the fabrication of inorganic arrays from molecular building blocks is restricted by the limited long-range order and orientation of the materials, as well as suitable methodologies for creating lithographic templates at sub-5 nm dimensions. In recent years, higher-order liquid crystals have emerged as functional thin films for organic electronics, nanoporous membranes, and templated synthesis, which provide opportunities for their use as lithographic templates. By choosing examples from these fields, recent progress toward the design of molecular building blocks is highlighted, with an emphasis on liquid crystals, to access sub-5 nm features, their directed self-assembly into oriented thin films, and, importantly, the fabrication of inorganic arrays. Finally, future challenges regarding sub-5 nm patterning with liquid crystals are discussed.
| Originele taal-2 | Engels |
|---|---|
| Artikelnummer | 1703713 |
| Aantal pagina's | 6 |
| Tijdschrift | Advanced Materials |
| Volume | 30 |
| Nummer van het tijdschrift | 3 |
| DOI's | |
| Status | Gepubliceerd - jan. 2018 |
Financiering
The authors acknowledge the many discussions and contributions with all of our former and current colleagues. Their names are given in the references cited. A special word of thanks is expressed to Dick Broer, Johan Lub, Bert Meijer, Sander Wuister, and Tamara Druzhinina for many inspiring discussions, fruitful collaborations and support. The research in our laboratory has been financially supported by Technology Foundation STW and ASML.
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