Direct bandgap quantum wells in hexagonal Silicon Germanium

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

16 Downloads (Pure)

Samenvatting

Silicon is indisputably the most advanced material for scalable electronics, but it is a poor choice as a light source for photonic applications, due to its indirect band gap. The recently developed hexagonal Si1−xGex semiconductor features a direct bandgap at least for x > 0.65, and the realization of quantum heterostructures would unlock new opportunities for advanced optoelectronic devices based on the SiGe system. Here, we demonstrate the synthesis and characterization of direct bandgap quantum wells realized in the hexagonal Si1−xGex system. Photoluminescence experiments on hex-Ge/Si0.2Ge0.8 quantum wells demonstrate quantum confinement in the hex-Ge segment with type-I band alignment, showing light emission up to room temperature. Moreover, the tuning range of the quantum well emission energy can be extended using hexagonal Si1−xGex/Si1−yGey quantum wells with additional Si in the well. These experimental findings are supported with ab initio bandstructure calculations. A direct bandgap with type-I band alignment is pivotal for the development of novel low-dimensional light emitting devices based on hexagonal Si1−xGex alloys, which have been out of reach for this material system until now.

Originele taal-2Engels
Artikelnummer5252
Aantal pagina's11
TijdschriftNature Communications
Volume15
Nummer van het tijdschrift1
DOI's
StatusGepubliceerd - 19 jun. 2024

Vingerafdruk

Duik in de onderzoeksthema's van 'Direct bandgap quantum wells in hexagonal Silicon Germanium'. Samen vormen ze een unieke vingerafdruk.

Citeer dit