Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation

Onderzoeksoutput: Bijdrage aan congresAbstract


In this contribution we show results of direct and indirect removal of nitric oxide (NO) with (sub)nanosecond pulses. The nanosecond pulse source is the 0.5-10-ns, 0-50-kV (positive and negative), 0.2-ns rise time pulse source that we recently developed at Eindhoven University of Technology. The direct-removal setup is an in-plasma removal setup, where the polluted air (with NO) is flushed directly through a pulsed corona plasma generated with the nanosecond pulses. In the indirect-removal setup, we generate ozone in clean air in the corona plasma reactor and mix this with the polluted gas stream after the plasma reactor. In this method, NO is removed by reaction with ozone and not directly in the plasma. We report on removal yields and by-product formation.
Originele taal-2Engels
StatusGepubliceerd - 19 jun 2017
Evenement2017 IEEE pulsed power conference - Hilton Metropole, Brighton, Verenigd Koninkrijk
Duur: 18 jun 201722 jun 2017


Congres2017 IEEE pulsed power conference
Verkorte titelPPC 2017
LandVerenigd Koninkrijk
Internet adres


Citeer dit

Huiskamp, T., Beckers, F. J. C. M., Hoeben, W. F. L. M., Pemen, A. J. M., & van Heesch, E. J. M. (2017). Direct and indirect NO removal with (sub)nanosecond pulses : yield and by-product formation. Abstract van 2017 IEEE pulsed power conference , Brighton, Verenigd Koninkrijk.