Device and method for generating a plasma discharge for patterning the surface of a substrate

P.P.M. Blom; A.A.E. Stevens; Laura Huijbregts; H.A.M. De Haan; A.H. Van Schijndel; E Te Sligte; C.J. Van Hijningen; T. Huiskamp

Device and method for generating a plasma discharge for patterning the surface of a substrate

P.P.M. Blom (Uitvinder), A.A.E. Stevens (Uitvinder), Laura Huijbregts (Uitvinder), H.A.M. De Haan (Uitvinder), A.H. Van Schijndel (Uitvinder), E Te Sligte (Uitvinder), C.J. Van Hijningen (Uitvinder), T. Huiskamp (Uitvinder)

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Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.

Originele taal-2	Engels
Octrooinummer	WO2011102711 (A1)
Prioriteitsdatum	17/02/10
Status	Gepubliceerd - 25 aug. 2011

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title = "Device and method for generating a plasma discharge for patterning the surface of a substrate",

abstract = "Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.",

author = "P.P.M. Blom and A.A.E. Stevens and Laura Huijbregts and {De Haan}, H.A.M. and {Van Schijndel}, A.H. and {Te Sligte}, E and {Van Hijningen}, C.J. and T. Huiskamp",

year = "2011",

month = aug,

day = "25",

language = "English",

type = "Patent",

note = "WO2011102711 (A1)",

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TY - PAT

T1 - Device and method for generating a plasma discharge for patterning the surface of a substrate

AU - Blom, P.P.M.

AU - Stevens, A.A.E.

AU - Huijbregts, Laura

AU - De Haan, H.A.M.

AU - Van Schijndel, A.H.

AU - Te Sligte, E

AU - Van Hijningen, C.J.

AU - Huiskamp, T.

PY - 2011/8/25

Y1 - 2011/8/25

N2 - Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.

AB - Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.

UR - http://worldwide.espacenet.com/publicationDetails/biblio?DB=EPODOC&II=0&ND=3&adjacent=true&locale=nl_NL&FT=D&date=20110825&CC=WO&NR=2011102711A1&KC=A1

M3 - Patent publication

M1 - WO2011102711 (A1)

ER -

Device and method for generating a plasma discharge for patterning the surface of a substrate

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