Device and method for generating a plasma discharge for patterning the surface of a substrate

P.M. Blom (Uitvinder), A.A.E. Stevens (Uitvinder), Laura Huijbregts (Uitvinder), H.A.M. De Haan (Uitvinder), A.H. Van Schijndel (Uitvinder), E Te Sligte (Uitvinder), C.J. Van Hijningen (Uitvinder), T. Huiskamp (Uitvinder)

Onderzoeksoutput: OctrooiOctrooi-publicatie

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Uittreksel

Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.
Originele taal-2Engels
OctrooinummerWO2011102711 (A1)
Prioriteitsdatum17/02/10
StatusGepubliceerd - 25 aug 2011

Vingerafdruk

plasma jets
electrodes
positioning
high voltages

Citeer dit

Blom, P. M., Stevens, A. A. E., Huijbregts, L., De Haan, H. A. M., Van Schijndel, A. H., Te Sligte, E., ... Huiskamp, T. (2011). Device and method for generating a plasma discharge for patterning the surface of a substrate. (Octrooi Nr. WO2011102711 (A1)).
Blom, P.M. (Uitvinder) ; Stevens, A.A.E. (Uitvinder) ; Huijbregts, Laura (Uitvinder) ; De Haan, H.A.M. (Uitvinder) ; Van Schijndel, A.H. (Uitvinder) ; Te Sligte, E (Uitvinder) ; Van Hijningen, C.J. (Uitvinder) ; Huiskamp, T. (Uitvinder). / Device and method for generating a plasma discharge for patterning the surface of a substrate. Octrooi Nr.: WO2011102711 (A1).
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title = "Device and method for generating a plasma discharge for patterning the surface of a substrate",
abstract = "Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.",
author = "P.M. Blom and A.A.E. Stevens and Laura Huijbregts and {De Haan}, H.A.M. and {Van Schijndel}, A.H. and {Te Sligte}, E and {Van Hijningen}, C.J. and T. Huiskamp",
year = "2011",
month = "8",
day = "25",
language = "English",
type = "Patent",
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Blom, PM, Stevens, AAE, Huijbregts, L, De Haan, HAM, Van Schijndel, AH, Te Sligte, E, Van Hijningen, CJ & Huiskamp, T 2011, Device and method for generating a plasma discharge for patterning the surface of a substrate, Octrooi Nr. WO2011102711 (A1).

Device and method for generating a plasma discharge for patterning the surface of a substrate. / Blom, P.M. (Uitvinder); Stevens, A.A.E. (Uitvinder); Huijbregts, Laura (Uitvinder); De Haan, H.A.M. (Uitvinder); Van Schijndel, A.H. (Uitvinder); Te Sligte, E (Uitvinder); Van Hijningen, C.J. (Uitvinder); Huiskamp, T. (Uitvinder).

Octrooi Nr.: WO2011102711 (A1).

Onderzoeksoutput: OctrooiOctrooi-publicatie

TY - PAT

T1 - Device and method for generating a plasma discharge for patterning the surface of a substrate

AU - Blom, P.M.

AU - Stevens, A.A.E.

AU - Huijbregts, Laura

AU - De Haan, H.A.M.

AU - Van Schijndel, A.H.

AU - Te Sligte, E

AU - Van Hijningen, C.J.

AU - Huiskamp, T.

PY - 2011/8/25

Y1 - 2011/8/25

N2 - Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.

AB - Device for generating a plasma discharge near a substrate for patterning the surface of the substrate, comprising a first electrode having a first discharge portion and a second electrode having a second discharge portion, a high voltage source for generating a high voltage difference between the first and the second electrode, and positioning means for positioning the first electrode with respect to the substrate. The device is further provided with an intermediate structure that is, in use, arranged in between the first electrode and the substrate while allowing for positioning the first electrode with respect to the substrate.

UR - http://worldwide.espacenet.com/publicationDetails/biblio?DB=EPODOC&II=0&ND=3&adjacent=true&locale=nl_NL&FT=D&date=20110825&CC=WO&NR=2011102711A1&KC=A1

M3 - Patent publication

M1 - WO2011102711 (A1)

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Blom PM, Stevens AAE, Huijbregts L, De Haan HAM, Van Schijndel AH, Te Sligte E et al, uitvinders. Device and method for generating a plasma discharge for patterning the surface of a substrate. WO2011102711 (A1). 2011 aug 25.