Deposition of a-Si:H by an expanding argon-hydrogen-silane plasma : plasma chemistry and film growth

M.C.M. Sanden, van de, W.M.M. Kessels, R.J. Severens, G.M. Janssen, D.C. Schram

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademic

Originele taal-2Engels
TitelAbstract presented at the TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg
Pagina's305
StatusGepubliceerd - 1998
Evenementconference; TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg; 1998-07-13; 1998-07-16 -
Duur: 13 jul 199816 jul 1998

Congres

Congresconference; TPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg; 1998-07-13; 1998-07-16
Periode13/07/9816/07/98
AnderTPP-5 : fifth European conference on thermal plasma processes, 13-16 July, 1998 St. Petersburg

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