Deep etched DBR gratings in InP for photonic integrated circuits

B. Docter; E.J. Geluk; F. Karouta; M.K. Smit

Deep etched DBR gratings in InP for photonic integrated circuits

B. Docter, E.J. Geluk, F. Karouta, M.K. Smit

Photonic Integration

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

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A novel fabrication process for the realization of deep-etched DBR gratings in InP is presented. It is shown that a combination of chromium and SiOx provides a very resistant etching mask for Cl2-based ICP etching. Both e-beam and optical lithography are used to limit e-beam writing time.

Originele taal-2	Engels
Titel	Proceedings of the 13th European Conference on Integrated Optics (ECIO 2007) 25-27 April 2007, Copenhagen, Denmark
Pagina's	ThG20-1/3
Status	Gepubliceerd - 2007
Evenement	13th European Conference on Integrated Optics (ECIO 2007) - Copenhagen, Denemarken Duur: 25 apr. 2007 → 27 apr. 2007 Congresnummer: 13

Congres

Congres	13th European Conference on Integrated Optics (ECIO 2007)
Verkorte titel	ECIO 2007
Land/Regio	Denemarken
Stad	Copenhagen
Periode	25/04/07 → 27/04/07
Ander	ECIO 2007) 25-27 April 2007, Copenhagen, Denmark

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@inproceedings{dec27418015e48bfb7ec5cab5b7f23a0,

title = "Deep etched DBR gratings in InP for photonic integrated circuits",

abstract = "A novel fabrication process for the realization of deep-etched DBR gratings in InP is presented. It is shown that a combination of chromium and SiOx provides a very resistant etching mask for Cl2-based ICP etching. Both e-beam and optical lithography are used to limit e-beam writing time.",

author = "B. Docter and E.J. Geluk and F. Karouta and M.K. Smit",

year = "2007",

language = "English",

pages = "ThG20--1/3",

booktitle = "Proceedings of the 13th European Conference on Integrated Optics (ECIO 2007) 25-27 April 2007, Copenhagen, Denmark",

note = "13th European Conference on Integrated Optics (ECIO 2007), ECIO 2007 ; Conference date: 25-04-2007 Through 27-04-2007",

}

TY - GEN

T1 - Deep etched DBR gratings in InP for photonic integrated circuits

AU - Docter, B.

AU - Geluk, E.J.

AU - Karouta, F.

AU - Smit, M.K.

N1 - Conference code: 13

PY - 2007

Y1 - 2007

N2 - A novel fabrication process for the realization of deep-etched DBR gratings in InP is presented. It is shown that a combination of chromium and SiOx provides a very resistant etching mask for Cl2-based ICP etching. Both e-beam and optical lithography are used to limit e-beam writing time.

AB - A novel fabrication process for the realization of deep-etched DBR gratings in InP is presented. It is shown that a combination of chromium and SiOx provides a very resistant etching mask for Cl2-based ICP etching. Both e-beam and optical lithography are used to limit e-beam writing time.

M3 - Conference contribution

SP - ThG20-1/3

BT - Proceedings of the 13th European Conference on Integrated Optics (ECIO 2007) 25-27 April 2007, Copenhagen, Denmark

T2 - 13th European Conference on Integrated Optics (ECIO 2007)

Y2 - 25 April 2007 through 27 April 2007

ER -

Deep etched DBR gratings in InP for photonic integrated circuits

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Congres

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