Deep dry etching process development for InP-based photonic crystals

R.W. Heijden, van der; E.W.J.M. Drift, van der; E.J. Geluk; F. Karouta; P.A.M. Nouwens; Y.S. Oei; H.W.M. Salemink

Deep dry etching process development for InP-based photonic crystals

R.W. Heijden, van der, E.W.J.M. Drift, van der, E.J. Geluk, F. Karouta, P.A.M. Nouwens, Y.S. Oei, H.W.M. Salemink

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

Originele taal-2	Engels
Titel	Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands
Plaats van productie	Piscataway
Uitgeverij	Institute of Electrical and Electronics Engineers
Pagina's	257-260
ISBN van geprinte versie	90-365-1990-X
Status	Gepubliceerd - 2003
Evenement	8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands - Enschede, Nederland Duur: 20 nov. 2003 → 21 nov. 2003

Congres

Congres	8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands
Land/Regio	Nederland
Stad	Enschede
Periode	20/11/03 → 21/11/03
Ander	Symposium IEEE/LEOS Benelux Chapter, Enschede, Netherlands

Citeer dit

Heijden, van der, R. W., Drift, van der, E. W. J. M., Geluk, E. J., Karouta, F., Nouwens, P. A. M., Oei, Y. S., & Salemink, H. W. M. (2003). Deep dry etching process development for InP-based photonic crystals. In Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands (blz. 257-260). Institute of Electrical and Electronics Engineers.

@inproceedings{e4f14b72c9da412ab7e299da06e77cc0,

title = "Deep dry etching process development for InP-based photonic crystals",

author = "{Heijden, van der}, R.W. and {Drift, van der}, E.W.J.M. and E.J. Geluk and F. Karouta and P.A.M. Nouwens and Y.S. Oei and H.W.M. Salemink",

year = "2003",

language = "English",

isbn = "90-365-1990-X",

pages = "257--260",

booktitle = "Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands ; Conference date: 20-11-2003 Through 21-11-2003",

}

Heijden, van der, RW, Drift, van der, EWJM, Geluk, EJ, Karouta, F, Nouwens, PAM, Oei, YS & Salemink, HWM 2003, Deep dry etching process development for InP-based photonic crystals. in Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands. Institute of Electrical and Electronics Engineers, Piscataway, blz. 257-260, 8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands, Enschede, Nederland, 20/11/03.

Deep dry etching process development for InP-based photonic crystals. / Heijden, van der, R.W.; Drift, van der, E.W.J.M.; Geluk, E.J. et al.
Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands. Piscataway: Institute of Electrical and Electronics Engineers, 2003. blz. 257-260.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

TY - GEN

T1 - Deep dry etching process development for InP-based photonic crystals

AU - Heijden, van der, R.W.

AU - Drift, van der, E.W.J.M.

AU - Geluk, E.J.

AU - Karouta, F.

AU - Nouwens, P.A.M.

AU - Oei, Y.S.

AU - Salemink, H.W.M.

PY - 2003

Y1 - 2003

M3 - Conference contribution

SN - 90-365-1990-X

SP - 257

EP - 260

BT - Proceedings of the 13th annual symposium of the IEEE/LEOS Benelux Chapter, 27-28 November 2008, Enschede, The Netherlands

PB - Institute of Electrical and Electronics Engineers

CY - Piscataway

T2 - 8th Annual Symposium of the IEEE/LEOS Benelux Chapter, November 20-21, 2003, Enschede, Netherlands

Y2 - 20 November 2003 through 21 November 2003

ER -