Debris-resistant liquid EUV mirrors

W. Soer; M. Herpen, van; K. Gielissen; V.Y. Banine

Debris-resistant liquid EUV mirrors

W. Soer, M. Herpen, van, K. Gielissen, V.Y. Banine

Onderzoeksoutput: Bijdrage aan congres › Poster

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Introduction Problem Sn-based EUV sources generate Sn debris that contaminates nearby EUV mirrors and thus reduces their reflectivity. Solution Liquid EUV mirrors: grazingincidence mirrors with a liquid metal or alloy surface. The liquid surface absorbs incoming Sn debris while maintaining a low surface roughness and hence a high EUV reflectivity. Applications Dose sensors, reflective debris mitigation tools (e.g. reflective foil trap) and debris-resistant collector optics. Objectives • Measure reflectivity of EUV radiation and ionic Sn debris on liquid metal surface. • Obtain good wetting of liquid metal on metal substrates to enable tilting of the liquid mirror into arbitrary orientation while maintaining a low surface roughness.

Originele taal-2	Engels
Status	Gepubliceerd - 2007

Bibliografische nota

Poster presented at the 8th ASML Technology Conference 2007, 30 May, 2007, Veldhoven, The Netherlands

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title = "Debris-resistant liquid EUV mirrors",

abstract = "Introduction Problem Sn-based EUV sources generate Sn debris that contaminates nearby EUV mirrors and thus reduces their reflectivity. Solution Liquid EUV mirrors: grazingincidence mirrors with a liquid metal or alloy surface. The liquid surface absorbs incoming Sn debris while maintaining a low surface roughness and hence a high EUV reflectivity. Applications Dose sensors, reflective debris mitigation tools (e.g. reflective foil trap) and debris-resistant collector optics. Objectives • Measure reflectivity of EUV radiation and ionic Sn debris on liquid metal surface. • Obtain good wetting of liquid metal on metal substrates to enable tilting of the liquid mirror into arbitrary orientation while maintaining a low surface roughness.",

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T1 - Debris-resistant liquid EUV mirrors

AU - Soer, W.

AU - Herpen, van, M.

AU - Gielissen, K.

AU - Banine, V.Y.

N1 - Poster presented at the 8th ASML Technology Conference 2007, 30 May, 2007, Veldhoven, The Netherlands

PY - 2007

Y1 - 2007

N2 - Introduction Problem Sn-based EUV sources generate Sn debris that contaminates nearby EUV mirrors and thus reduces their reflectivity. Solution Liquid EUV mirrors: grazingincidence mirrors with a liquid metal or alloy surface. The liquid surface absorbs incoming Sn debris while maintaining a low surface roughness and hence a high EUV reflectivity. Applications Dose sensors, reflective debris mitigation tools (e.g. reflective foil trap) and debris-resistant collector optics. Objectives • Measure reflectivity of EUV radiation and ionic Sn debris on liquid metal surface. • Obtain good wetting of liquid metal on metal substrates to enable tilting of the liquid mirror into arbitrary orientation while maintaining a low surface roughness.

AB - Introduction Problem Sn-based EUV sources generate Sn debris that contaminates nearby EUV mirrors and thus reduces their reflectivity. Solution Liquid EUV mirrors: grazingincidence mirrors with a liquid metal or alloy surface. The liquid surface absorbs incoming Sn debris while maintaining a low surface roughness and hence a high EUV reflectivity. Applications Dose sensors, reflective debris mitigation tools (e.g. reflective foil trap) and debris-resistant collector optics. Objectives • Measure reflectivity of EUV radiation and ionic Sn debris on liquid metal surface. • Obtain good wetting of liquid metal on metal substrates to enable tilting of the liquid mirror into arbitrary orientation while maintaining a low surface roughness.

M3 - Poster

ER -

Debris-resistant liquid EUV mirrors

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