Samenvatting
Numerical simulations of abrupt N-P-N structures with homogeneously doped layers show a systematic deviation from the analytical formulae, due to the application of the depletion approximation. The error in the depletion approximation, as a function of barrier doping, is found to reach a maximum in the limit of an intrinsic barrier region. The potential and charge distribution in the static N-i-N structure, including the effects of the charge distribution at the N-sides, is calculated analytically. For this structure a linear current-voltage relation is derived, and found in agreement with numerical results.
Originele taal-2 | Engels |
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Pagina's (van-tot) | 897-904 |
Tijdschrift | Solid-State Electronics |
Volume | 35 |
Nummer van het tijdschrift | 7 |
DOI's | |
Status | Gepubliceerd - 1992 |