Samenvatting
We apply the Lie algebraic method to reflecting optical systems with plane-symmetric freeform mirrors. Using analytical ray-tracing equations, we construct an optical map. The expansion of this map gives us the aberration coefficients in terms of initial ray coordinates. The Lie algebraic method is applied to treat aberrations up to arbitrary order. The presented method provides a systematic and rigorous approach to the derivation, treatment, and composition of aberrations in plane-symmetric systems. We give the results for second- and third-order aberrations and apply them to three single-mirror examples.
| Originele taal-2 | Engels |
|---|---|
| Pagina's (van-tot) | 1215-1224 |
| Aantal pagina's | 10 |
| Tijdschrift | Journal of the Optical Society of America A, Optics, Image Science and Vision |
| Volume | 40 |
| Nummer van het tijdschrift | 6 |
| DOI's | |
| Status | Gepubliceerd - 1 jun. 2023 |
Financiering
Topconsortium voor Kennis en Innovatie (\u201CPhotolitho MCS\u201D (TKI-HTSM 19.0162)). The authors thank Teus Tukker (ASML) for his fruitful remarks.
| Financiers | Financiernummer |
|---|---|
| Topconsortium voor Kennis en Innovatie | TKI-HTSM 19.0162 |
Vingerafdruk
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