Computer simulation with PLASIMO of a microwave plasma used for the plasma chemical vapor deposition process

M. Jimenez-Diaz, M.J. Donker, van den, J. Dijk, van, J.J.A.M. Mullen, van der

Onderzoeksoutput: Bijdrage aan congresPosterAcademic

Originele taal-2Engels
StatusGepubliceerd - 2008

Bibliografische nota

Poster presented at the 20st Symposium Plasma Physics & Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands

Citeer dit

Jimenez-Diaz, M., Donker, van den, M. J., Dijk, van, J., & Mullen, van der, J. J. A. M. (2008). Computer simulation with PLASIMO of a microwave plasma used for the plasma chemical vapor deposition process.