Compositional and electrical characterisation of the hydrogen-oxygen terminated diamond (100) surface

In this work (100) diamond films are hydrogenated using a conventional MWPE-CVD (microwave plasma enhanced chem. vapor deposition) reactor contg. a H2 or a H2/O2 mixt. For the latter, XPS (XPS) expts. show an increased presence of oxygen at the (sub)-surface. Contrary to pure H2-plasma treated samples, H2/O2-treated layers still posses enough cond. to enable STS (Scanning Tunneling Spectroscopy) investigations to be carried out after an annealing at 410 DegC in UHV (Ultra High Vacuum). Evidence for surface resonance states is detected, yielding a possible explanation for the measured cond. UPS (UPS) data point to a neg. electron affinity of -0.3 eV for the H2/O2-treated layers. [on SciFinder (R)]