Coating of particles by plasma enhanced chemical vapour deposition

The interest in dusty plasma research, which is a relatively new field in plasma physics, has increased with the development of microelectronics. The dust particles appear as pollutant in this industrial processing. Recently, however, they are seen from a different point of view – they can be useful in various technologies: chemical catalysis, solar cell fabrication, ceramics etc.[1,2,3] In this investigation we have concentrated on coating of dust particles. This process allows us to obtain composite particles with combined properties of the base powder material with those of the deposited layer. The process of particle coating has applications in different fields: the toner production, the chemical catalysis, fluorescence etc.