Characterization of a projection lens using the extended Nijboer-Zernike approach

P. Dirksen; J.J.M. Braat; P. De Bisschop; A.J.E.M. Janssen; C.A.H. Juffermans; A.M. Williams

doi:10.1117/12.474523

Characterization of a projection lens using the extended Nijboer-Zernike approach

P. Dirksen, J.J.M. Braat, P. De Bisschop, A.J.E.M. Janssen, C.A.H. Juffermans, A.M. Williams

Control Systems

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In this paper we give the proof of principle of a new experimental method to determine the aberrations of an optical system in the field. The measurement is based on the observation of the intensity point spread function of the lens. To analyse and interpret the measurement, use is made of an analytical method, the so-called extended Nijboer-Zernike approach. The new method is applicable to lithographic projection lenses, but also to EUV mirror systems or microscopes such as the objective lens of an optical mask inspection tool. Phase retrieval is demonstrated both analytically and experimentally. Theory and experimental results are given.

Originele taal-2	Engels
Titel	Proceedings Optical Microlithography XV, 5 - 8 March 2002, Santa Clara, California
Plaats van productie	Bellingham
Uitgeverij	SPIE
Pagina's	1392-1399
DOI's	https://doi.org/10.1117/12.474523
Status	Gepubliceerd - 2002

Publicatie series

Naam	Proceedings of SPIE
Volume	4691
ISSN van geprinte versie	0277-786X

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10.1117/12.474523

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Dirksen, P., Braat, J. J. M., De Bisschop, P., Janssen, A. J. E. M., Juffermans, C. A. H., & Williams, A. M. (2002). Characterization of a projection lens using the extended Nijboer-Zernike approach. In Proceedings Optical Microlithography XV, 5 - 8 March 2002, Santa Clara, California (blz. 1392-1399). (Proceedings of SPIE; Vol. 4691). SPIE. https://doi.org/10.1117/12.474523

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abstract = "In this paper we give the proof of principle of a new experimental method to determine the aberrations of an optical system in the field. The measurement is based on the observation of the intensity point spread function of the lens. To analyse and interpret the measurement, use is made of an analytical method, the so-called extended Nijboer-Zernike approach. The new method is applicable to lithographic projection lenses, but also to EUV mirror systems or microscopes such as the objective lens of an optical mask inspection tool. Phase retrieval is demonstrated both analytically and experimentally. Theory and experimental results are given.",

author = "P. Dirksen and J.J.M. Braat and {De Bisschop}, P. and A.J.E.M. Janssen and C.A.H. Juffermans and A.M. Williams",

year = "2002",

doi = "10.1117/12.474523",

language = "English",

series = "Proceedings of SPIE",

publisher = "SPIE",

pages = "1392--1399",

booktitle = "Proceedings Optical Microlithography XV, 5 - 8 March 2002, Santa Clara, California",

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Characterization of a projection lens using the extended Nijboer-Zernike approach. / Dirksen, P.; Braat, J.J.M.; De Bisschop, P. et al.
Proceedings Optical Microlithography XV, 5 - 8 March 2002, Santa Clara, California. Bellingham: SPIE, 2002. blz. 1392-1399 (Proceedings of SPIE; Vol. 4691).

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

TY - GEN

T1 - Characterization of a projection lens using the extended Nijboer-Zernike approach

AU - Dirksen, P.

AU - Braat, J.J.M.

AU - De Bisschop, P.

AU - Janssen, A.J.E.M.

AU - Juffermans, C.A.H.

AU - Williams, A.M.

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AB - In this paper we give the proof of principle of a new experimental method to determine the aberrations of an optical system in the field. The measurement is based on the observation of the intensity point spread function of the lens. To analyse and interpret the measurement, use is made of an analytical method, the so-called extended Nijboer-Zernike approach. The new method is applicable to lithographic projection lenses, but also to EUV mirror systems or microscopes such as the objective lens of an optical mask inspection tool. Phase retrieval is demonstrated both analytically and experimentally. Theory and experimental results are given.

U2 - 10.1117/12.474523

DO - 10.1117/12.474523

M3 - Conference contribution

T3 - Proceedings of SPIE

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BT - Proceedings Optical Microlithography XV, 5 - 8 March 2002, Santa Clara, California

PB - SPIE

CY - Bellingham

ER -

Characterization of a projection lens using the extended Nijboer-Zernike approach

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