Centrifugal etching : a promising new tool to achieve deep etching results

This paper presents some theoretical considerations to show that by etching in an enhanced acceleration field, such ascan be obtained in a centrifuge, it is possible to circumvent many of the typical objectionable features of some of the traditional etching techniques. The theory is corroborated by a small series of experiments. These clearly indicate that centrifugal etching may yield very low undercutting, large etch rates, and, if proper care is taken, an extremely smooth surfacefinish.