Samenvatting
A review of recent developments in the field of passivation of c-Si surfaces is presented, with a particular focus on materials that can be prepared by atomic layer deposition (ALD). Besides Al2O3, various other novel passivation schemes have recently been developed, such as Ga2O3, Ta2O5, SiO2/Al2O3, HfO2/Al2O3 and TiO2, which altogether can passivate a wider variety of doped and textured Si surfaces. Moreover, they are interesting candidates in the emerging field of passivating contacts, for instance as novel tunnel oxides. In this field, ALD can offer some distinct advantages, such as a precise control in film thickness, composition and even area-selective deposition.
| Originele taal-2 | Engels |
|---|---|
| Titel | 2017 IEEE 44th Photovoltaic Specialist Conference, PVSC 2017 |
| Plaats van productie | Piscataway |
| Uitgeverij | Institute of Electrical and Electronics Engineers |
| Pagina's | 1-6 |
| Aantal pagina's | 6 |
| ISBN van elektronische versie | 978-1-5090-5605-7 |
| ISBN van geprinte versie | 978-1-5090-5606-4 |
| DOI's | |
| Status | Gepubliceerd - 25 mei 2018 |
| Evenement | 44th IEEE Photovoltaic Specialist Conference, PVSC 2017 - Washington, Verenigde Staten van Amerika Duur: 25 jun. 2017 → 30 jun. 2017 Congresnummer: 44 |
Congres
| Congres | 44th IEEE Photovoltaic Specialist Conference, PVSC 2017 |
|---|---|
| Verkorte titel | PVSC 2017 |
| Land/Regio | Verenigde Staten van Amerika |
| Stad | Washington |
| Periode | 25/06/17 → 30/06/17 |
Duurzame ontwikkelingsdoelstellingen van de VN
Deze output draagt bij aan de volgende duurzame ontwikkelingsdoelstelling(en)
-
SDG 7 – Betaalbare en schone energie
Vingerafdruk
Duik in de onderzoeksthema's van 'Atomic-layer deposited passivation schemes for c-Si solar cells'. Samen vormen ze een unieke vingerafdruk.Citeer dit
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver