Atom lithography without laser cooling

B. Smeets; P. Straten, van der; T. Meijer; C.G.C.H.M. Fabrie; K.A.H. Leeuwen, van

doi:10.1007/s00340-009-3867-3

Atom lithography without laser cooling

B. Smeets
, P. Straten, van der
, T. Meijer
, C.G.C.H.M. Fabrie
, K.A.H. Leeuwen, van

Coherence and Quantum Technology

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

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Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.

Originele taal-2	Engels
Pagina's (van-tot)	697-705
Aantal pagina's	9
Tijdschrift	Applied Physics B: Lasers and Optics
Volume	98
Nummer van het tijdschrift	4
DOI's	https://doi.org/10.1007/s00340-009-3867-3
Status	Gepubliceerd - 2010

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title = "Atom lithography without laser cooling",

abstract = "Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.",

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AB - Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.

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Atom lithography without laser cooling

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