Atom lithography of Fe

E. Sligte, te; B. Smeets; K.M.R. van der Stam; R.W. Herfst; P. Straten, van der; H.C.W. Beijerinck; K.A.H. Leeuwen, van

doi:10.1063/1.1818347

Atom lithography of Fe

E. Sligte, te, B. Smeets, K.M.R. van der Stam, R.W. Herfst, P. Straten, van der, H.C.W. Beijerinck, K.A.H. Leeuwen, van

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

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Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics

Originele taal-2	Engels
Pagina's (van-tot)	4493-4495
Tijdschrift	Applied Physics Letters
Volume	85
Nummer van het tijdschrift	19
DOI's	https://doi.org/10.1063/1.1818347
Status	Gepubliceerd - 2004

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abstract = "Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics",

author = "{Sligte, te}, E. and B. Smeets and {van der Stam}, K.M.R. and R.W. Herfst and {Straten, van der}, P. and H.C.W. Beijerinck and {Leeuwen, van}, K.A.H.",

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AU - Sligte, te, E.

AU - Smeets, B.

AU - van der Stam, K.M.R.

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AU - Straten, van der, P.

AU - Beijerinck, H.C.W.

AU - Leeuwen, van, K.A.H.

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AB - Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics

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Atom lithography of Fe

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