Area-selective atomic layer deposition: Role of surface chemistry

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Samenvatting

Area-selective atomic layer deposition is being considered as the next paradigm shift in device fabrication. Besides semiconductor manufacturing, area-selective ALD presents unique opportunities in catalysis and large-area electronics applications. In this contribution, the results of recently developed area-selective ALD processes for In2O3 and ZnO are revisited. These approaches rely on substratedependent nucleation that originates from chemoselective precursor adsorption. Here, we focus on the role of thermodynamics and kinetics of the surface reactions in enabling area-selective deposition. Thermodynamics and kinetics of reactions were calculated by density functional theory (DFT) methods. We believe that our findings can be valuable in understanding area-selective ALD processes at a molecular level, the mechanisms underpinning the chemoselective adsorption and thus in advancing the field.

Originele taal-2Engels
TitelECS Transactions
RedacteurenStefan De Gendt, Jolien Dendooven, Fred Roozeboom, Chanyuan Liu, Jeffrey W. Elam, Oscar van der Straten
UitgeverijElectrochemical Society, Inc.
Pagina's39-48
Aantal pagina's10
Volume80
Uitgave3
ISBN van elektronische versie9781607685395
ISBN van geprinte versie978-1-62332-472-8
DOI's
StatusGepubliceerd - 1 jan 2017
Evenement13th Symposium on Atomic Layer Deposition Applications, ALD 2017- 232nd ECS Meeting - National Harbor, Verenigde Staten van Amerika
Duur: 1 okt 20175 okt 2017

Publicatie series

NaamECS Transactions
Nummer3
Volume80
ISSN van geprinte versie1938-6737
ISSN van elektronische versie1938-5862

Congres

Congres13th Symposium on Atomic Layer Deposition Applications, ALD 2017- 232nd ECS Meeting
LandVerenigde Staten van Amerika
StadNational Harbor
Periode1/10/175/10/17

Citeer dit

Mameli, A., Karasulu, B., Verheijen, M. A., Mackus, A. J. M., Kessels, W. M. M., & Roozeboom, F. (2017). Area-selective atomic layer deposition: Role of surface chemistry. In S. De Gendt, J. Dendooven, F. Roozeboom, C. Liu, J. W. Elam, & O. van der Straten (editors), ECS Transactions (3 redactie, Vol. 80, blz. 39-48). (ECS Transactions; Vol. 80, Nr. 3). Electrochemical Society, Inc.. https://doi.org/10.1149/08003.0039ecst