Apparatus suitable for plasma surface treating and process for preparing membrane layers

H.J.A. Schuurmans (Uitvinder), J. Werner (Uitvinder), D.C. Schram (Uitvinder), G.M.W. Kroesen (Uitvinder), Shell International Research (NL) (Uitvinder)

Onderzoeksoutput: OctrooiOctrooi-publicatie

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Samenvatting

The invention relates to an apparatus suitable for plasma surface treating (e.g. forming a membrane layer on a substrate) which comprises a plasma generation section (2) which is in communication via at least one plasma inlet means (4) (e.g. a nozzle) with an enclosed plasma treating section (3) which is operable at a lower pressure than the plasma generation section (2), and wherein the plasma treating-section (3) is in communication with inlet means (10) for a fluid (e.g. polymerizable) reactant. The invention furthermore relates to a process for preparing membrane layers employing such an apparatus.
Originele taal-2Engels
StatusGepubliceerd - 1988

Bibliografische nota

Patent EP0295752 (B1) 1988-12-21 ; US5120568 1992-06-09 ; AU597832 1990-06-07 ; AU1764988 1988-12-22 ; DE386716D 1992-03-05 ; GB8713986 1987-07-22 ; JP1100265 1989-04-18

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