ALD – a truly enabling nanotechnology: And how the Netherlands contributed to its wide spread application

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Samenvatting

Atomic layer deposition (ALD) is a method to precisely deposit high-quality
nanolayers of all kind of materials. As such, it is a true nanotechnology which – among a multitude of other applications – enables the fabrication of the integrated circuits in your smart phone.
In this introductory article, the method of ALD and its merits are briefly introduced. Also its history is presented in a nutshell and it is discussed how our country has played a vital role in the research and development of ALD and its widespread use now and in the future.
Originele taal-2Engels
Artikelnummer2
Pagina's (van-tot)6-9
TijdschriftNevac Blad
Volume58
Nummer van het tijdschriftspecial
StatusGepubliceerd - 2 jun 2020

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