Samenvatting
Plasma etching is an important process in the semiconductor manufacturing process. In order to precisely control the ion energy for better process quality, a tailored pulse-shape voltage waveform is applied to the plasma reactor table. Traditionally, a linear amplifier is used to generate this waveform, which results in poor efficiency. This paper proposes a switched-mode power amplifier as a substitute to the traditional linear amplifier. The electric equivalent circuit of the plasma reactor is introduced and a basic topology for the switched-mode power amplifier is derived. The basic topology is able to generate the required waveform but it has a low efficiency of charging the capacitive load in practice. Therefore, an efficiencyimproved topology is proposed by adopting resonant charging. A prototype is built in order to validate the research. The experiments show that the presented solution yields a significantly reduced input power compared to the normally used linear amplifier in this application.
Originele taal-2 | Engels |
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Titel | 2020 22nd European Conference on Power Electronics and Applications (EPE'20 ECCE Europe) |
Uitgeverij | Institute of Electrical and Electronics Engineers |
ISBN van elektronische versie | 9789075815368 |
DOI's | |
Status | Gepubliceerd - sep. 2020 |
Evenement | 22nd European Conference on Power Electronics and Applications, EPE 2020 ECCE Europe - https://epe-ecce-conferences.com/epe2020/, Lyon, Frankrijk Duur: 7 sep. 2020 → 11 sep. 2020 https://epe-ecce-conferences.com/epe2020 |
Congres
Congres | 22nd European Conference on Power Electronics and Applications, EPE 2020 ECCE Europe |
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Verkorte titel | EPE'20 ECCE Europe |
Land/Regio | Frankrijk |
Stad | Lyon |
Periode | 7/09/20 → 11/09/20 |
Internet adres |