A perspective on stage dynamics and control

H. Butler

A perspective on stage dynamics and control

H. Butler

Control Systems

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

1 Citaat (Scopus)

15 Downloads (Pure)

Samenvatting

In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) onto a wafer. Accurate positioning of the reticle and the wafer is of crucial importance for creating a working IC. This paper reflects on the stage dynamics and control design in Stepper technology, introduces the modifications needed to successfully implement Scanner technology, and shows the further improvements in dualstage TWINSCAN systems.

Originele taal-2	Engels
Titel	Proceedings of the ASPE 2008 Spring Topical Meeting "Precision Mechanical Design and Mechatronics for Sub-50 nm Semiconductor Equipment", April 7-8 2008, Berkeley, California
Uitgeverij	American Society of Precision Engineering (ASPE)
Pagina's	1-3
Status	Gepubliceerd - 2008
Evenement	conference; ASPE 2008 Spring Topical Meeting - Duur: 1 jan 2008 → …

Congres

Congres	conference; ASPE 2008 Spring Topical Meeting
Periode	1/01/08 → …
Ander	ASPE 2008 Spring Topical Meeting

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Citeer dit

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title = "A perspective on stage dynamics and control",

abstract = "In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask ({\textquoteleft}reticle{\textquoteright}) onto a wafer. Accurate positioning of the reticle and the wafer is of crucial importance for creating a working IC. This paper reflects on the stage dynamics and control design in Stepper technology, introduces the modifications needed to successfully implement Scanner technology, and shows the further improvements in dualstage TWINSCAN systems.",

author = "H. Butler",

year = "2008",

language = "English",

pages = "1--3",

booktitle = "Proceedings of the ASPE 2008 Spring Topical Meeting {"}Precision Mechanical Design and Mechatronics for Sub-50 nm Semiconductor Equipment{"}, April 7-8 2008, Berkeley, California",

publisher = "American Society of Precision Engineering (ASPE)",

note = "conference; ASPE 2008 Spring Topical Meeting ; Conference date: 01-01-2008",

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A perspective on stage dynamics and control. / Butler, H.

Proceedings of the ASPE 2008 Spring Topical Meeting "Precision Mechanical Design and Mechatronics for Sub-50 nm Semiconductor Equipment", April 7-8 2008, Berkeley, California. American Society of Precision Engineering (ASPE), 2008. blz. 1-3.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

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AB - In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) onto a wafer. Accurate positioning of the reticle and the wafer is of crucial importance for creating a working IC. This paper reflects on the stage dynamics and control design in Stepper technology, introduces the modifications needed to successfully implement Scanner technology, and shows the further improvements in dualstage TWINSCAN systems.

M3 - Conference contribution

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BT - Proceedings of the ASPE 2008 Spring Topical Meeting "Precision Mechanical Design and Mechatronics for Sub-50 nm Semiconductor Equipment", April 7-8 2008, Berkeley, California

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