A perspective on stage dynamics and control

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In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) onto a wafer. Accurate positioning of the reticle and the wafer is of crucial importance for creating a working IC. This paper reflects on the stage dynamics and control design in Stepper technology, introduces the modifications needed to successfully implement Scanner technology, and shows the further improvements in dualstage TWINSCAN systems.
Originele taal-2Engels
TitelProceedings of the ASPE 2008 Spring Topical Meeting "Precision Mechanical Design and Mechatronics for Sub-50 nm Semiconductor Equipment", April 7-8 2008, Berkeley, California
UitgeverijAmerican Society of Precision Engineering (ASPE)
StatusGepubliceerd - 2008
Evenementconference; ASPE 2008 Spring Topical Meeting -
Duur: 1 jan 2008 → …


Congresconference; ASPE 2008 Spring Topical Meeting
Periode1/01/08 → …
AnderASPE 2008 Spring Topical Meeting

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