At present, few layer graphene (G) and nitrogen doped few layer graphene (N doped-G) are firstly coated on Cu foil via chemical vapor deposition (CVD) method and G and N doped-G coated Cu foil is transferred to the indium tin oxide (ITO) substrate surface to obtain electrodes. Pd metal is electrodeposited onto the N doped-G/ITO electrode (Pd-N doped-G/ITO). Pd-N doped-G/ITO electrode are characterized with advanced surface characterization methods such as Raman spectroscopy and SEM-EDX. Characterization results reveal that G and N structures are succesfully obtained and the presence of Pd on Pd-N doped-G/ITO is confirmed with SEM-EDX mapping. The cyclic voltammetry (CV), chronoamperometry (CA), and electrochemical impedance spectroscopy (EIS) are employed to examine glucose electrooxidation of G/ITO, N-doped G/ITO, and Pd-N-doped G/ITO electrodes. P–N-dopedG/ITO electrode exhibits the best glucose electrooxidation activity with 2 mA/cm2 specific activity. Density functional theory (DFT) calculations are also carried out to better understand the interaction of the molecules on Pd modified G (Pd-G) and Pd modified N-doped G (Pd-3NG) surfaces.