A mechanistic molecular-scale simulation model of pattern formation in photoresist layers for extreme ultraviolet nanolithography

Onderzoeksoutput: Scriptie › Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)

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Originele taal-2	Engels
Kwalificatie	Doctor in de Filosofie
Toekennende instantie	Applied Physics and Science Education
Begeleider(s)/adviseur	Coehoorn, Reinder, Promotor Bobbert, Peter A., Promotor
Datum van toekenning	26 mei 2025
Plaats van publicatie	Eindhoven
Uitgever	Eindhoven University of Technology
Gedrukte ISBN's	978-90-386-6377-7
Status	Gepubliceerd - 26 mei 2025

Proefschrift.

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@phdthesis{2e5cc0d45f884356bb95911ce07d1ddf,

title = "A mechanistic molecular-scale simulation model of pattern formation in photoresist layers for extreme ultraviolet nanolithography",

author = "\{Fern{\'a}ndez M{\'i}guez\}, Lois",

note = "Proefschrift.",

year = "2025",

month = may,

day = "26",

language = "English",

isbn = "978-90-386-6377-7",

publisher = "Eindhoven University of Technology",

type = "Phd Thesis 1 (Research TU/e / Graduation TU/e)",

school = "Applied Physics and Science Education",

}