A combinational approach to enhance barrier properties of thin films of polymers: Seeding and capping of PECVD thin films by PEALD

M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A.P.K. Devi

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2 Citaties (Scopus)

Uittreksel

A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and plasma‐enhanced atomic layer deposition (PEALD) is presented. Thin films of SiOx and SiOxCyHz obtained from PECVD were grown either subsequently on a PEALD seeding layer (SiO2) or were capped by ultrathin PEALD films of Al2O3 or SiO2. To study the impact of PEALD layers on the overall GBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro‐defects mm−2) and improved barrier performance (OTR = 0.8 cm3 m−2 day−1), while the PEALD capping‐route produced GBLs free of macro‐defects.
Originele taal-2Engels
Artikelnummer1700209
Aantal pagina's11
TijdschriftPlasma Processes and Polymers
Volume15
Nummer van het tijdschrift5
DOI's
StatusGepubliceerd - 8 mrt 2018

Vingerafdruk

Atomic layer deposition
inoculation
atomic layer epitaxy
Chemical vapor deposition
Polymers
vapor deposition
Thin films
polymers
barrier layers
thin films
Defect density
Gases
Macros
gases
Oxygen
Polyethylene Terephthalates
polyethylene terephthalate
defects
oxygen
Polyethylene terephthalates

Citeer dit

Gebhard, M. ; Mitschker, F. ; Hoppe, C. ; Aghaee, M. ; Rogalla, D. ; Creatore, M. ; Grundmeier, G. ; Awakowicz, P. ; Devi, A.P.K. / A combinational approach to enhance barrier properties of thin films of polymers: Seeding and capping of PECVD thin films by PEALD. In: Plasma Processes and Polymers. 2018 ; Vol. 15, Nr. 5.
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abstract = "A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and plasma‐enhanced atomic layer deposition (PEALD) is presented. Thin films of SiOx and SiOxCyHz obtained from PECVD were grown either subsequently on a PEALD seeding layer (SiO2) or were capped by ultrathin PEALD films of Al2O3 or SiO2. To study the impact of PEALD layers on the overall GBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro‐defects mm−2) and improved barrier performance (OTR = 0.8 cm3 m−2 day−1), while the PEALD capping‐route produced GBLs free of macro‐defects.",
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A combinational approach to enhance barrier properties of thin films of polymers: Seeding and capping of PECVD thin films by PEALD. / Gebhard, M.; Mitschker, F.; Hoppe, C.; Aghaee, M.; Rogalla, D.; Creatore, M.; Grundmeier, G.; Awakowicz, P.; Devi, A.P.K.

In: Plasma Processes and Polymers, Vol. 15, Nr. 5, 1700209, 08.03.2018.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

TY - JOUR

T1 - A combinational approach to enhance barrier properties of thin films of polymers: Seeding and capping of PECVD thin films by PEALD

AU - Gebhard, M.

AU - Mitschker, F.

AU - Hoppe, C.

AU - Aghaee, M.

AU - Rogalla, D.

AU - Creatore, M.

AU - Grundmeier, G.

AU - Awakowicz, P.

AU - Devi, A.P.K.

PY - 2018/3/8

Y1 - 2018/3/8

N2 - A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and plasma‐enhanced atomic layer deposition (PEALD) is presented. Thin films of SiOx and SiOxCyHz obtained from PECVD were grown either subsequently on a PEALD seeding layer (SiO2) or were capped by ultrathin PEALD films of Al2O3 or SiO2. To study the impact of PEALD layers on the overall GBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro‐defects mm−2) and improved barrier performance (OTR = 0.8 cm3 m−2 day−1), while the PEALD capping‐route produced GBLs free of macro‐defects.

AB - A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and plasma‐enhanced atomic layer deposition (PEALD) is presented. Thin films of SiOx and SiOxCyHz obtained from PECVD were grown either subsequently on a PEALD seeding layer (SiO2) or were capped by ultrathin PEALD films of Al2O3 or SiO2. To study the impact of PEALD layers on the overall GBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro‐defects mm−2) and improved barrier performance (OTR = 0.8 cm3 m−2 day−1), while the PEALD capping‐route produced GBLs free of macro‐defects.

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