Projectdetails
| Status | Actief |
|---|---|
| Effectieve start/einddatum | 1/01/22 → 31/12/28 |
Topsector
- TKI-HTSM
PPS23-2-03576607 MASC D&C "Modelling And Shape Control for lithography system applications"
- van de Wouw, Nathan (Project Manager)
- Subrahamanian Moosath, Adarsh (Projectmedewerker)
- Fey, Rob H.B. (Project deelnemer)
- Vacancy PHD (Projectmedewerker)
Project: Third tier