Projecten per jaar
Persoonlijk profiel
Quote
"My aim is to advance the field of atomic scale processing for energy and information technologies such as photovoltaics and nanoelectronics"
Research profile
Erwin Kessels is a full professor at the Department of Applied Physics of Eindhoven University of Technology (TU/e). He is also the scientific director of the NanoLab@TU/e facilities which provides full-service and open-access clean room infrastructure for R&D in nanotechnology. Erwin’s research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced) chemical vapor deposition (CVD) and atomic layer deposition (ALD) for a wide variety of applications, mostly within the areas of nanoelectronics and photovoltaics.
Within the field of ALD, he has contributed most prominently by his work on plasma-assisted ALD, his research related to ALD for photovoltaics, and ALD for nanopatterning (including area-selective ALD). Currently, Erwin is focusing his research mostly on atomic scale processing, a field which is believed to grow in importance quickly in the next decade, for a wide variety of application domains.
Academic background
Erwin received his MSc (1996) and PhD (with honors) (2000) in Applied Physics from TU/e. His doctoral thesis work was partly carried out at the University of California Santa Barbara and as a postdoc he was affiliated to the Colorado State University and Philipps University in Marburg (Germany). In 2004/2005 he spent a six-months sabbatical at the University of California Berkeley. In 2007 the American Vacuum Society awarded him the Peter Mark Memorial Award. Erwin received an NWO Vici grant in 2010 to set up a large research program on ‘nanomanufacturing’ in order to bridge the gap between nanoscience/nanotechnology and industrial application. In 2008 he was chair of the International Conference on Atomic Layer Deposition in 2008 (Bruges, Belgium) and in 2019 he received the ALD Innovator award at this yearly conference. Erwin will serve as a chair of the 7th workshop on atomic layer etching in 2020 (Ghent, Belgium). Since 2019 Erwin has also been appointed as Visiting International Professor and a DFG Mercator fellow at the Ruhr University Bochum. Erwin is active within the American Vacuum Society and has been President of the Netherlands Vacuum Society. He is an associate editor of the Journal of Vacuum Science and Technology. He has published over 300 papers, has given 100+ invited presentations, and holds 4 patents. He frequently (co-)organizes ALD-related workshops and is the founder of the ALD Academy (www.ALDacademy) and the blog AtomicLimits.com.
Expertise gerelateerd aan duurzame ontwikkelingsdoelstellingen van de VN
In 2015 stemden de VN-lidstaten in met 17 wereldwijde duurzame ontwikkelingsdoelstellingen (Sustainable Development Goals, SDG's) om armoede te beëindigen, de planeet te beschermen en voor iedereen welvaart te garanderen. Het werk van deze persoon draagt bij aan de volgende duurzame ontwikkelingsdoelstelling(en):
Vingerafdruk
- 1 Soortgelijke profielen
Samenwerkingen en hoofdonderzoeksgebieden uit de afgelopen vijf jaar
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Plasma Source model validation for Atomic-Scale Processing TKI-HTSM/24.0365
Kessels, W. M. M. (Project Manager) & Wubs, J. R. (Projectmedewerker)
1/01/24 → 31/12/29
Project: Third tier
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TKI-HTSM/24.0176 - ASPEA: Atomic-Scale Processing Equipment for the Ångstrom Era
Mackus, A. J. M. (Project Manager), Macco, B. (Projectmedewerker), Kessels, W. M. M. (Projectmedewerker), Lam, C. H. X. (Projectmedewerker), Vacancy PD (Projectmedewerker), van Gurp, M. C. (Projectmedewerker), Krieger, G. (Projectmedewerker), Vacancy PHD (Projectmedewerker), Janssen, T. (Projectmedewerker) & Trevisan, A. (Projectmedewerker)
1/01/24 → 31/12/29
Project: Third tier
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PMP: Nieuwe materialen voor hoog-temperatuur PICs, nano-gestructureerde oppervlakken, meta-surfaces , nieuwe golflengtes
Macco, B. (Project Manager), Theeuwes, R. J. (Projectmedewerker), Massaro, L. (Projectmedewerker) & Kessels, W. M. M. (Projectmedewerker)
1/01/23 → 12/12/28
Project: Third tier
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Understanding H2 plasma surface interaction: fromEUV optics to 2D materials
Kessels, W. M. M. (Project Manager), Salden, T. P. W. (Projectmedewerker), van den Biggelaar, T. (Projectmedewerker), Vacancy Tech (Projectmedewerker), Vacancy PD (Projectmedewerker) & Vacancy PHD (Projectmedewerker)
1/01/22 → 9/09/27
Project: Third tier
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Sample Runs
Kessels, W. M. M. (Project Manager) & Kessels, W. M. M. (Project Manager)
1/03/22 → 30/06/25
Project: Third tier
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Unlocking the synergy of ALD and ALE: tailoring crystallinity and etch rates in ZnO thin films at the atomic scale
Gwoen, J. H., Yang, H. L., Kim, M. C., Jeong, G. M., Kim, T. K., Visser, C., Kessels, W. M. M. (Corresponding author) & Park, J.-S. (Corresponding author), 1 feb. 2026, In: Applied Surface Science. 717, 10 blz., 164735.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
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Area-Selective Atomic Layer Deposition through Selective Passivation of SiO2with a SF6/H2Plasma
Bolkenbaas, O. C. A., Merkx, M. J. M., Chittock, N. J., Tezsevin, I., Kessels, W. M. M., Sandoval, T. E. (Corresponding author) & Mackus, A. J. M. (Corresponding author), 22 jul. 2025, In: Chemistry of Materials. 37, 14, blz. 4982-4991 10 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand1 Citaat (Scopus)69 Downloads (Pure) -
Atomic layer deposition
Kessels, W. M. M. (Corresponding author), Devi, A. P. K., Park, J.-S., Ritala, M., Yanguas-Gil, A. & Wiemer, C., 16 okt. 2025, In: Nature Reviews. Methods Primers. 5, 25 blz., 66.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
4 Citaten (Scopus) -
Atomic layer etching of TiN by oxidation and SF6-H2 plasma exposure: ALE window defined by HF, H, and F
Krieger, G. (Corresponding author), Peeters, S. A., Vonken, B., Chittock, N., Mackus, A. J. M., Kessels, W. M. M. & Knoops, H. (Corresponding author), 10 nov. 2025, In: Applied Physics Letters. 127, 19, 6 blz., 191606 .Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand4 Downloads (Pure) -
De strijd om de chipindustrie: behoudt Nederland zijn sleutelrol?
Op het Veld, R. J. C. & Kessels, W. M. M. (Overig), 17 jun. 2025Onderzoeksoutput: Niet-tekstuele vorm › Web publicatie / site › Professioneel
Open Access
Datasets
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LLMs4SchemaDiscovery: A Human-in-the-Loop Workflow for Scientific Schema Mining with Large Language Models
Sadruddin, S. (Ontwerper), D'Souza, J. (Ontwerper), Poupaki, E. (Ontwerper), Watkins, A. (Ontwerper), Giglou, H. B. (Ontwerper), Rula, A. (Ontwerper), Karasulu, B. (Ontwerper), Auer, S. (Ontwerper), Mackus, A. (Ontwerper) & Kessels, E. (Ontwerper), Zenodo, 2 okt. 2025
Dataset: Software
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Supplementary Material
Deijkers, J. H. (Ontwerper), Thepass, H. (Ontwerper), Verheijen, M. A. (Ontwerper), Sprey, H. (Ontwerper), Maes, J. W. (Ontwerper), Kessels, W. M. M. (Ontwerper) & Mackus, A. J. M. (Ontwerper), AIP Publishing, 2024
DOI: 10.60893/figshare.jva.27111202.v1, https://aip.figshare.com/articles/dataset/Supplementary_Material/27111202/1 en nog één link, https://aip.figshare.com/articles/dataset/Supplementary_Material/27111199/1 (minder tonen)
Dataset
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Supporting information
Merkx, M. J. M. (Ontwerper), Tezsevin, I. (Ontwerper), Yu, P. (Ontwerper), Janssen, T. (Ontwerper), Heinemans, R. H. G. M. (Ontwerper), Lengers, R. J. (Ontwerper), Chen, J.-R. (Ontwerper), Jezewski, C. J. (Ontwerper), Clendenning, S. B. (Ontwerper), Kessels, W. M. M. (Ontwerper), Sandoval, T. E. (Ontwerper) & Mackus, A. J. M. (Ontwerper), AIP Publishing, 22 mei 2024
DOI: 10.60893/figshare.jcp.25743183, https://aip.figshare.com/articles/dataset/Supporting_information/25743183 en nog één link, https://aip.figshare.com/articles/dataset/Supporting_information/25743183/1 (minder tonen)
Dataset
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Data underlying the publication: Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3
Chittock, N. J. (Ontwerper), Mackus, A. J. M. (Ontwerper), Shu, Y. (Ontwerper), Elliott, S. D. (Ontwerper), Knoops, H. C. M. (Ontwerper) & Kessels, W. M. M. (Ontwerper), 4TU.Centre for Research Data, 21 aug. 2023
DOI: 10.4121/b7383943-2ae0-4339-8cbf-657765023fd6, https://data.4tu.nl/datasets/b7383943-2ae0-4339-8cbf-657765023fd6 en nog één link, https://data.4tu.nl/datasets/b7383943-2ae0-4339-8cbf-657765023fd6/1 (minder tonen)
Dataset
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Data underlying the publication: Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
Tezsevin, I. (Ontwerper), Maas, J. F. W. (Bijdrager), Merkx, M. J. M. (Ontwerper), Lengers, R. J. (Ontwerper), Kessels, W. M. M. (Ontwerper), Sandoval, T. E. (Ontwerper) & Mackus, A. J. M. (Ontwerper), 4TU.Centre for Research Data, 7 aug. 2023
DOI: 10.4121/0bb03d8b-d1ac-49bc-8010-a498a981cf3e.v1, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e/1 en nog één link, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e (minder tonen)
Dataset
Prijzen
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ALD Innovator Award
Kessels, E. (Ontvanger), 22 jul. 2019
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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NWO Vici Award : Nanotechnology: the path from lab to production
Kessels, W. M. M. (Ontvanger), 2009
Prijs: NWO › Vici › Wetenschappelijk
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Research Center for Integrated Nano-Photonics
Dorren, H. J. S. (Ontvanger), Kessels, W. M. M. (Ontvanger), Koenraad, P. M. (Ontvanger), Koonen, A. M. J. (Ontvanger) & Koopmans, B. (Ontvanger), 2014
Prijs: NWO › Zwaartekracht › Wetenschappelijk
Activiteiten
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Plasma-assisted atomic layer deposition: from basics to applications
Kessels, W. M. M. (Spreker)
10 feb. 2021Activiteit: Types gesprekken of presentaties › Keynote spreker › Wetenschappelijk
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SALD (Externe organisatie)
Kessels, W. M. M. (Voorzitter)
17 sep. 2020 → 31 dec. 2023Activiteit: Types lidmaatschap › Lidmaatschap van bestuur › Professioneel
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New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
Mameli, A. (Deelnemer), Verheijen, M. A. (Deelnemer), Karasulu, B. (Deelnemer), Mackus, A. J. M. (Deelnemer), Kessels, W. M. M. (Deelnemer) & Roozeboom, F. (Spreker)
30 sep. 2018 → 4 okt. 2018Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
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Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma
Mameli, A. (Deelnemer), Verheijen, M. A. (Deelnemer), Karasulu, B. (Deelnemer), Mackus, A. J. M. (Deelnemer), Kessels, W. M. M. (Deelnemer) & Roozeboom, F. (Uitgenodigde spreker)
24 jul. 2018 → 28 jul. 2018Activiteit: Types gesprekken of presentaties › Genodigd spreker › Wetenschappelijk
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Journal of Vacuum Science and Technology A (Tijdschrift)
Kessels, W. M. M. (Lid redactieraad)
2015 → …Activiteit: Types publicaties van collegiale toetsing en redactioneel werk › Redactioneel werk › Wetenschappelijk
Cursussen
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Plasma processing science and technology
Deijkers, J. H., Kessels, W. M. M., Knoops, H. C. M. & Mackus, A. J. M. 1/09/17 → 31/08/26
Cursus
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Semiconductor Nanofabrication Science & Technology
Mackus, A. J. M., Kessels, W. M. M., Knoops, H. C. M., Macco, B. & Langereis, E. 1/09/25 → 31/08/26
Cursus
Knipsels
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Verliert Comet den Anschluss an die nächste Halbleitergeneration?
7/07/25
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Bedrijf van Matthijs (29) haalt 20 miljoen binnen voor maken van supercomputer: 'Gaat wereld veranderen'
6/03/25
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Technische Universiteit Eindhoven gaat ‘twee keer zoveel studenten opleiden’ voor de chipsector
27/07/24
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Nearfield eist vanuit Rotterdam zijn plaats in de wereldwijde chipmarkt op
30/06/24
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Einde aan de panelenhonger: heeft zonne-energie nog toekomst in Nederland?
1/06/24
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
Impacts
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Advanced ALD technologies
Creatore, A. (Onderzoeker), Kessels, E. (Onderzoeker) & Mackus, A. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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CO2 neutral fuels
Engeln, R. (Onderzoeker) & Kessels, E. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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Fundamentals of ultrathin film growth
Kessels, E. (Onderzoeker) & Bol, A. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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Future nanoelectronics and nanopatterning
Bol, A. (Onderzoeker), Kessels, E. (Onderzoeker) & Mackus, A. (Content manager)
Impact: Research Topic/Theme (at group level)
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Nanolayers for solar cells
Creatore, A. (Onderzoeker) & Kessels, E. (Content manager)
Impact: Research Topic/Theme (at group level)
Scriptie
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The influence of the substrate conditions on plasma beam deposited a-C:H-films
Kessels, W. M. M. (Auteur), Gielen, J. W. A. M. (Afstudeerdocent 1), van de Sanden, M. C. M. (Afstudeerdocent 2) & Schram, D. C. (Afstudeerdocent 2), 31 aug. 1996Scriptie/Masterproef: Master
Bestand