Projecten per jaar
Persoonlijk profiel
Quote
"My aim is to advance the field of atomic scale processing for energy and information technologies such as photovoltaics and nanoelectronics"
Research profile
Erwin Kessels is a full professor at the Department of Applied Physics of Eindhoven University of Technology (TU/e). He is also the scientific director of the NanoLab@TU/e facilities which provides full-service and open-access clean room infrastructure for R&D in nanotechnology. Erwin’s research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced) chemical vapor deposition (CVD) and atomic layer deposition (ALD) for a wide variety of applications, mostly within the areas of nanoelectronics and photovoltaics.
Within the field of ALD, he has contributed most prominently by his work on plasma-assisted ALD, his research related to ALD for photovoltaics, and ALD for nanopatterning (including area-selective ALD). Currently, Erwin is focusing his research mostly on atomic scale processing, a field which is believed to grow in importance quickly in the next decade, for a wide variety of application domains.
Academic background
Erwin received his MSc (1996) and PhD (with honors) (2000) in Applied Physics from TU/e. His doctoral thesis work was partly carried out at the University of California Santa Barbara and as a postdoc he was affiliated to the Colorado State University and Philipps University in Marburg (Germany). In 2004/2005 he spent a six-months sabbatical at the University of California Berkeley. In 2007 the American Vacuum Society awarded him the Peter Mark Memorial Award. Erwin received an NWO Vici grant in 2010 to set up a large research program on ‘nanomanufacturing’ in order to bridge the gap between nanoscience/nanotechnology and industrial application. In 2008 he was chair of the International Conference on Atomic Layer Deposition in 2008 (Bruges, Belgium) and in 2019 he received the ALD Innovator award at this yearly conference. Erwin will serve as a chair of the 7th workshop on atomic layer etching in 2020 (Ghent, Belgium). Since 2019 Erwin has also been appointed as Visiting International Professor and a DFG Mercator fellow at the Ruhr University Bochum. Erwin is active within the American Vacuum Society and has been President of the Netherlands Vacuum Society. He is an associate editor of the Journal of Vacuum Science and Technology. He has published over 300 papers, has given 100+ invited presentations, and holds 4 patents. He frequently (co-)organizes ALD-related workshops and is the founder of the ALD Academy (www.ALDacademy) and the blog AtomicLimits.com.
Expertise gerelateerd aan duurzame ontwikkelingsdoelstellingen van de VN
In 2015 stemden de VN-lidstaten in met 17 wereldwijde duurzame ontwikkelingsdoelstellingen (Sustainable Development Goals, SDG's) om armoede te beëindigen, de planeet te beschermen en voor iedereen welvaart te garanderen. Het werk van deze persoon draagt bij aan de volgende duurzame ontwikkelingsdoelstelling(en):
Vingerafdruk
- 1 Soortgelijke profielen
Samenwerkingen en hoofdonderzoeksgebieden uit de afgelopen vijf jaar
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Plasma Source model validation for Atomic-Scale Processing TKI-HTSM/24.0365
Kessels, W. M. M. (Project Manager) & Wubs, J. R. (Projectmedewerker)
1/01/24 → 31/12/29
Project: Third tier
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TKI-HTSM/24.0176 - ASPEA: Atomic-Scale Processing Equipment for the Ångstrom Era
Mackus, A. J. M. (Project Manager), Macco, B. (Projectmedewerker), Kessels, W. M. M. (Projectmedewerker), Lam, C. H. X. (Projectmedewerker), Vacancy PD (Projectmedewerker), van Gurp, M. C. (Projectmedewerker), KG Krieger, G. (Projectmedewerker) & Vacancy PHD (Projectmedewerker)
1/01/24 → 31/12/29
Project: Third tier
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Sample Runs
Kessels, W. M. M. (Project Manager) & Kessels, W. M. M. (Project Manager)
1/03/22 → 30/06/25
Project: Third tier
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Understanding H2 plasma surface interaction: fromEUV optics to 2D materials
Kessels, W. M. M. (Project Manager), Salden, T. P. W. (Projectmedewerker), van den Biggelaar, T. (Projectmedewerker) & Vacancy Tech (Projectmedewerker)
1/01/22 → 9/09/27
Project: Third tier
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Metal Oxides: Maturing of an Efficient Novel Technology Upgrade for PV-Manufacturing
Kessels, W. M. M. (Project Manager), Koushik, D. (Projectmedewerker) & Theeuwes, R. J. (Projectmedewerker)
1/02/20 → 30/06/22
Project: Onderzoek direct
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Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma
Chittock, N., Maas, J. F. W., Tezsevin, I., Merkx, M. J. M., Knoops, H. C. M., Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), 21 jan. 2025, In: Journal of Materials Chemistry C. 13, 3, blz. 1345-1358 14 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand23 Downloads (Pure) -
Leaders of the LTP Community: Career Profiles: Richard van de Sanden
van de Sanden, M. C. M. (Bijdrager), Creatore, M., Kessels, W. M. M. & Tsampas, M., 21 mrt. 2025, In: ILTPC Newsletter. 48, blz. 4-5 2 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Professioneel
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New cleanroom to be given prominent place on campus
Kessels, W. M. M. (Bijdrager), 25 mrt. 2025, In: Cursor. 2025, week 4Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Populair
Open Access -
Plasma-Enhanced Spatial Atomic Layer Deposition on 2D and 3D Surface Topologies: The Case of Amorphous and Crystalline TiO2
van de Poll, M., Shen, J., Hilfiker, J., Verheijen, M. A., Poodt, P. W. G., van den Bruele, F., Kessels, W. M. M. & Macco, B. (Corresponding author), 13 feb. 2025, In: Journal of Physical Chemistry C. 129, 6, blz. 3310-3320 11 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand8 Downloads (Pure) -
Superconducting NbxTi1−xN prepared at high deposition rates with plasma-enhanced atomic layer deposition and substrate biasing
Peeters, S. A. (Corresponding author), Nelissen, L. E. W. H. M., Besprozvannyy, D., Choudhary, N., Lennon, C. T., Verheijen, M. A., Powell, M., Bailey, L., Hadfield, R. H., Kessels, W. M. M. & Knoops, H. (Corresponding author), jun. 2025, In: AVS Quantum Science. 7, 2, 9 blz., 026801.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand2 Downloads (Pure)
Datasets
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Supporting information
Merkx, M. J. M. (Ontwerper), Tezsevin, I. (Ontwerper), Yu, P. (Ontwerper), Janssen, T. (Ontwerper), Heinemans, R. H. G. M. (Ontwerper), Lengers, R. J. (Ontwerper), Chen, J.-R. (Ontwerper), Jezewski, C. J. (Ontwerper), Clendenning, S. B. (Ontwerper), Kessels, W. M. M. (Ontwerper), Sandoval, T. E. (Ontwerper) & Mackus, A. J. M. (Ontwerper), AIP Publishing, 22 mei 2024
DOI: 10.60893/figshare.jcp.25743183, https://aip.figshare.com/articles/dataset/Supporting_information/25743183 en nog één link, https://aip.figshare.com/articles/dataset/Supporting_information/25743183/1 (minder tonen)
Dataset
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Supplementary Material
Deijkers, J. H. (Ontwerper), Thepass, H. (Ontwerper), Verheijen, M. A. (Ontwerper), Sprey, H. (Ontwerper), Maes, J. W. (Ontwerper), Kessels, W. M. M. (Ontwerper) & Mackus, A. J. M. (Ontwerper), AIP Publishing, 2024
DOI: 10.60893/figshare.jva.27111202.v1, https://aip.figshare.com/articles/dataset/Supplementary_Material/27111202/1 en nog één link, https://aip.figshare.com/articles/dataset/Supplementary_Material/27111199/1 (minder tonen)
Dataset
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Data underlying the publication: Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
Tezsevin, I. (Ontwerper), Maas, J. F. W. (Bijdrager), Merkx, M. J. M. (Ontwerper), Lengers, R. J. (Ontwerper), Kessels, W. M. M. (Ontwerper), Sandoval, T. E. (Ontwerper) & Mackus, A. J. M. (Ontwerper), 4TU.Centre for Research Data, 7 aug. 2023
DOI: 10.4121/0bb03d8b-d1ac-49bc-8010-a498a981cf3e.v1, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e/1 en nog één link, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e (minder tonen)
Dataset
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Data underlying the publication: Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Yu, P. (Ontwerper), Merkx, M. J. M. (Ontwerper), Tezsevin, I. (Ontwerper), Lemaire, P. C. (Ontwerper), Hausmann, D. M. (Ontwerper), Sandoval, T. E. (Ontwerper), Kessels, W. M. M. (Ontwerper) & Mackus, A. J. M. (Ontwerper), 4TU.Centre for Research Data, 2 mei 2024
DOI: 10.4121/c357264b-f395-4409-bedc-328f45f6e6ac, https://data.4tu.nl/datasets/c357264b-f395-4409-bedc-328f45f6e6ac en 2 meer links, https://data.4tu.nl/datasets/c357264b-f395-4409-bedc-328f45f6e6ac/1, https://data.4tu.nl/datasets/c357264b-f395-4409-bedc-328f45f6e6ac/2 (minder tonen)
Dataset
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Data underlying the publication: Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations
Li, J. (Ontwerper), Tezsevin, I. (Ontwerper), Merkx, M. J. M. (Ontwerper), Maas, J. F. W. (Ontwerper), Kessels, W. M. M. (Ontwerper), Sandoval, T. E. (Ontwerper) & Mackus, A. J. M. (Ontwerper), 4TU.Centre for Research Data, 7 aug. 2023
DOI: 10.4121/33df3424-ed9b-49cb-910e-64a6d37aa6b0, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0 en nog één link, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0/1 (minder tonen)
Dataset
Prijzen
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ALD Innovator Award
Kessels, E. (Ontvanger), 22 jul. 2019
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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NWO Vici Award : Nanotechnology: the path from lab to production
Kessels, W. M. M. (Ontvanger), 2009
Prijs: NWO › Vici › Wetenschappelijk
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Research Center for Integrated Nano-Photonics
Dorren, H. J. S. (Ontvanger), Kessels, W. M. M. (Ontvanger), Koenraad, P. M. (Ontvanger), Koonen, A. M. J. (Ontvanger) & Koopmans, B. (Ontvanger), 2014
Prijs: NWO › Zwaartekracht › Wetenschappelijk
Activiteiten
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Plasma-assisted atomic layer deposition: from basics to applications
Kessels, W. M. M. (Spreker)
10 feb. 2021Activiteit: Types gesprekken of presentaties › Keynote spreker › Wetenschappelijk
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SALD (Externe organisatie)
Kessels, W. M. M. (Voorzitter)
17 sep. 2020 → 31 dec. 2023Activiteit: Types lidmaatschap › Lidmaatschap van bestuur › Professioneel
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New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
Mameli, A. (Deelnemer), Verheijen, M. A. (Deelnemer), Karasulu, B. (Deelnemer), Mackus, A. J. M. (Deelnemer), Kessels, W. M. M. (Deelnemer) & Roozeboom, F. (Spreker)
30 sep. 2018 → 4 okt. 2018Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
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Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma
Mameli, A. (Deelnemer), Verheijen, M. A. (Deelnemer), Karasulu, B. (Deelnemer), Mackus, A. J. M. (Deelnemer), Kessels, W. M. M. (Deelnemer) & Roozeboom, F. (Uitgenodigde spreker)
24 jul. 2018 → 28 jul. 2018Activiteit: Types gesprekken of presentaties › Genodigd spreker › Wetenschappelijk
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Journal of Vacuum Science and Technology A (Tijdschrift)
Kessels, W. M. M. (Lid redactieraad)
2015 → …Activiteit: Types publicaties van collegiale toetsing en redactioneel werk › Redactioneel werk › Wetenschappelijk
Cursussen
Knipsels
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Bedrijf van Matthijs (29) haalt 20 miljoen binnen voor maken van supercomputer: 'Gaat wereld veranderen'
6/03/25
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Technische Universiteit Eindhoven gaat ‘twee keer zoveel studenten opleiden’ voor de chipsector
27/07/24
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Nearfield eist vanuit Rotterdam zijn plaats in de wereldwijde chipmarkt op
30/06/24
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Einde aan de panelenhonger: heeft zonne-energie nog toekomst in Nederland?
1/06/24
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Geen idee is te gek in de chip-laboratoria van TU/e
25/05/24
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
Impacts
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Advanced ALD technologies
Creatore, M. (Onderzoeker), Kessels, W. M. M. (Onderzoeker) & Mackus, A. J. M. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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CO2 neutral fuels
Engeln, R. A. H. (Onderzoeker) & Kessels, W. M. M. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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Fundamentals of ultrathin film growth
Kessels, W. M. M. (Onderzoeker) & Bol, A. A. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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Future nanoelectronics and nanopatterning
Bol, A. A. (Onderzoeker), Kessels, W. M. M. (Onderzoeker) & Mackus, A. J. M. (Content manager)
Impact: Research Topic/Theme (at group level)
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Nanolayers for solar cells
Creatore, M. (Onderzoeker) & Kessels, W. M. M. (Content manager)
Impact: Research Topic/Theme (at group level)
Scriptie
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The influence of the substrate conditions on plasma beam deposited a-C:H-films
Kessels, W. M. M. (Auteur), Gielen, J. W. A. M. (Afstudeerdocent 1), van de Sanden, M. C. M. (Afstudeerdocent 2) & Schram, D. C. (Afstudeerdocent 2), 31 aug. 1996Scriptie/Masterproef: Master
Bestand