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Persoonlijk profiel

Research profile

My academic interest can be summarized as follows: studying the growth of ultra-thin films by atomic-layer deposition and their characterization using advanced (nonlinear) optical diagnostics with an emphasis on their defects and non-idealities.

Academic background

My most recent work was a postdoc focussing on the growth and characterization of 2D transition metal dichalcogenides (TMDs). In this project, I co-developed new ALD processes for the growth of these TMDs. Furthermore, I developed a new framework for texture characterization using Raman spectroscopy based upon new fundamental insight I obtained into the Raman response of nanocrystalline TMDs.

My PhD research encompassed mechanistic studies of the prototypical ALD processes for metal-oxide (thermal ALD of Al2O3) and for noble metal ALD (thermal ALD of Pt) using a new diagnostics: broadband sum-frequency generation (BB-SFG) spectroscopy. The surface chemistry during these processes was studied for the first time with this state-of-the-art technique which relies on the mixing of mid-IR and visible fs laser pulses. As such, SFG in a second-order nonlinear optical process making BB-SFG spectroscopy inherently surface sensitive. This property, combined with the all optical nature of BB-SFG, makes it ideally suited for in-situ studies of the surface chemistry. A purpose built setup was realized in the project and these BB-SFG studies revealed several key non-idealities in the growth mechanism of these well-studied prototypical ALD processes.

I also studyied the surface chemistry of plasma-enhanced ALD of Al2O3 using ATR-FTIR spectroscopy at the Colorado School of Mines (CSM) and I worked on the characterization of the SiO2/Si and Al2O3/Si interface relevant for nano-electronic and photovoltaic devices with phase-sensitive second-harmonic generation (SHG) spectroscopy. In conjunctino to probing the electronic structure of the interface, SHG can also reveal and quantify the presence of built-in charges near these interfaces which is a key property for device fabrication.

Apart from my passion for physics, I am also interested in computer science which resulted in e.g.  a project at the department of Mathematics and Computer Science performing real-time visualization of the execution of computer code.

Vingerafdruk Duik in de onderzoeksthema's waar Vincent Vandalon actief is. Deze onderwerplabels komen voort uit het werk van deze persoon. Samen vormen ze een unieke vingerafdruk.

  • 8 Vergelijkbare profielen
Atomic layer deposition Chemische stoffen
atomic layer epitaxy Fysica en Astronomie
Plasmas Chemische stoffen
Aluminum Oxide Chemische stoffen
Ozone Chemische stoffen
oxygen plasma Fysica en Astronomie
harmonic generations Fysica en Astronomie
Thickness control Chemische stoffen

Netwerk Recente externe samenwerking op landenniveau. Duik in de details door op de stippen te klikken.

Onderzoeksoutput 2010 2019

  • 190 Citaten
  • 17 Tijdschriftartikel
  • 1 Conferentiebijdrage
  • 1 Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)
3 Citaties (Scopus)

Chemical analysis of the interface between hybrid organic−inorganic perovskite and atomic layer deposited Al2O3

Koushik, D., Hazendonk, L., Zardetto, V., Vandalon, V., Verheijen, M. A., Kessels, W. M. M. & Creatore, M., 9 jan 2019, In : ACS Applied Materials & Interfaces. 11, blz. 5526-5535 10 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Open Access
Bestand
Perovskite
Atomic layer deposition
Chemical analysis
Infrared radiation
Stretching
Open Access
Bestand
Atomic layer deposition
Hydrogen
Plasmas
Electrocatalysts
Temperature

Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3

Mione, M., Engeln, R., Vandalon, V., Kessels, E. & Roozeboom, F., 21 aug 2019, In : Applied Physics Letters. 115, 8, 5 blz., 083101

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

optical emission spectroscopy
atmospheric pressure
atomic layer epitaxy
chemistry
reaction products

Infrared and optical emission spectroscopy study of the surface chemistry in atmospheric-pressure plasma-enhanced spatial ALD of Al2O3

Mione, M., Engeln, R., Vandalon, V., Kessels, E. & Roozeboom, F., 2019, In : ECS Transactions. 92, 3, blz. 35-44 10 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Optical emission spectroscopy
Surface chemistry
Atmospheric pressure
Infrared radiation
Plasmas

Initial growth study of atomic-layer deposition of Al2O3 by vibrational sum-frequency generation

Vandalon, V. & Kessels, E., 16 jul 2019, In : Langmuir. 35, 32, blz. 10374-10382 9 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Open Access
Bestand
Atomic layer deposition
Vibrational spectra
atomic layer epitaxy
cycles
Spectroscopy

Prijzen

Student Award best oral presentation

Vincent Vandalon (Ontvanger), 30 jun 2015

Prijs: AndersWerk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.)Wetenschappelijk

Scriptie

Characterization of self-assembled monolayers with FTIR and SE

Auteur: Riberi, F., 2013

Begeleider: Vandalon, V. (Afstudeerdocent 1) & Kessels, W. (Afstudeerdocent 2)

Scriptie/masterproef: Bachelor

Bestand

Second-Harmonic Generation: spectroscopic phase and intensity study of the Si(100) interface with SiO2 and Al2O3 thin films

Auteur: Vandalon, V., 31 aug 2011

Begeleider: Terlinden, N. (Afstudeerdocent 1) & Kessels, W. (Afstudeerdocent 2)

Scriptie/masterproef: Master

Bestand

Study of the Si(100) Al2O3 interface by second-harmonic general and electrically detected magnetic resonance

Auteur: Bosch, R., 31 mrt 2012

Begeleider: Vandalon, V. (Afstudeerdocent 1), Terlinden, N. (Afstudeerdocent 2) & Kessels, W. (Afstudeerdocent 2)

Scriptie/masterproef: Master

Bestand