• 403 Citaties
1994 …2020

Onderzoeksresultaten per jaar

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Persoonlijk profiel

Quote

"Small projects take about the same time to manage as the large ones, so it is important to find partners able solve a substantial part of the problem on their own."

Research profile

Vadim Banine is Professor of Physics and Technology of EUV Lithography in the Elementary Processes in Gas Discharges group at Eindhoven University of Technology. This is a part-time position, which he combines with his work as Director of ASML.  

Banine's research interests include EUV lithography, plasma physics, surface physics and chemistry as well as accelerator technology. EUV lithography is a promising technology to make electronic chips smaller and more powerful - a promise that ASML is working on bringing to reality, in collaboration with universities such as TU/e, Twente University and the Russian ISAN.  

At ASML, Banine is responsible for general research program definition and roadmapping, managing and coaching research project leaders, external laboratories and projects worldwide and the development of the EUV research process, its knowledge base, working group capacity and external network.

His strong career in industry make Banine an expert on organization and development of research programs and groups, project leadership, combining enterprise and science and bringing results to development.

Banine is a member of the Scientific Advisory Commitee (SAC) at FOM. He has more than 60 patents, is the winner of the ASML patent award and has over 40 publications to his name.

Academic background

Vadim Banine holds a cum laude MSc degree from the Moscow Institute of Physics and Technology (Russia). He obtained his PhD from Eindhoven University of Technology (TU/e) in 1994, on the metrology of combustion plasma and shock tubes. He did a postdoc at TU/e in the Laboratory of Heat and Mass Transfer in 1995 and 1996. In 1996, he started working for ASML - first as lead engineer, then as external project coordinator, as head of the ASML laboratory and even later as senior manager of general research. In 2010, Banine became Research Director at ASML and in 2017 he became its Director. He was appointed part-time Professor at TU/e in 2013.

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Onderzoeksoutput

Open Access
  • Energy distribution functions for ions from pulsed EUV-induced plasmas in low pressure N2-diluted H2 gas

    Beckers, J., van de Ven, T., de Meijere, C. A., van der Horst, R., van Kampen, M. & Banine, V., 2 apr 2019, In : Applied Physics Letters. 114, 13, 5 blz., 133502.

    Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

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  • 5 Citaten (Scopus)
    6 Downloads (Pure)

    EUV-induced plasma: a peculiar phenomenon of a modern lithographic technology

    Beckers, J., van de Ven, T., van der Horst, R., Astakhov, D. . I. & Banine, V., 2 jul 2019, In : Applied Sciences. 9, 14, 23 blz., 2827.

    Onderzoeksoutput: Bijdrage aan tijdschriftArtikel recenserenAcademicpeer review

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  • 3 Citaten (Scopus)
    53 Downloads (Pure)

    Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy

    Beckers, J., van de Wetering, F. M. J. H., Platier, B., van Ninhuijs, M. A. W., Brussaard, G. J. H., Banine, V. Y. & Luiten, O. J., 16 jan 2019, In : Journal of Physics D: Applied Physics. 52, 3, 17 blz., 034004.

    Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

  • 9 Citaten (Scopus)
    7 Downloads (Pure)

    Time-resolved ion energy distribution functions in the afterglow of an EUV-induced plasma

    Beckers, J., van de Ven, T. & Banine, V., 28 okt 2019, In : Applied Physics Letters. 115, 18, 4 blz., 183502.

    Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

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  • 2 Citaten (Scopus)
    21 Downloads (Pure)

    Scriptie

    Characterization and mitigation of debris from a Sn-based EUV source

    Auteur: Gielissen, K., 30 jun 2005

    Begeleider: van der Mullen, J. (Afstudeerdocent 1), Banine, V. (Externe coach) & Kieft, E. (Afstudeerdocent 2)

    Scriptie/masterproef: Master

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