Persoonlijk profiel
Research profile
Tiago C. Dias is an Assistant Professor in the Elementary Processes in Gas Discharges group at Eindhoven University of Technology (TU/e). His research focuses on modelling the interactions between low-temperature plasmas and surfaces, ranging from reactor-scale dimensions (cm-m) down to the nanometer scale. Other areas of expertise include electron kinetics and reaction mechanisms in low-temperature plasmas, as well as plasma-liquid interactions.
His current research topics are closely aligned with applications in semiconductor industry (e.g., plasma etching and EUV-induced plasmas) and in environmental remediation by plasmas (e.g., removal of PFAS molecules from water).
Academic background
Tiago C. Dias holds a MSc degree in Physics Engineering (2019) and a PhD in Plasma Physics (2023), both from Instituto Superior Técnico, Lisbon, Portugal. Part of the PhD work was carried out at the Institute of Plasma Physics in Prague, Czech Republic. He worked as a postdoctoral researcher at the University of Michigan, USA, from 2024 to 2025. He started is current position as Assistant Professor at TU/e in 2026.
Expertise gerelateerd aan duurzame ontwikkelingsdoelstellingen van de VN
In 2015 stemden de VN-lidstaten in met 17 wereldwijde duurzame ontwikkelingsdoelstellingen (Sustainable Development Goals, SDG's) om armoede te beëindigen, de planeet te beschermen en voor iedereen welvaart te garanderen. Het werk van deze persoon draagt bij aan de volgende duurzame ontwikkelingsdoelstelling(en):
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SDG 7 – Betaalbare en schone energie
Vingerafdruk
- 1 Soortgelijke profielen
Samenwerkingen en hoofdonderzoeksgebieden uit de afgelopen vijf jaar
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Beyond electron impact: Dissociation driven by molecular collisions in CO2 nanosecond pulsed plasmas
Dias, T. C. (Corresponding author), Martini, L. M., Tosi, P. & Guerra, V., jun. 2026, In: Journal of CO2 Utilization. 108, 15 blz., 103435.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand1 Downloads (Pure) -
Advances in plasma-driven solution electrochemistry
Bruggeman, P. J. (Corresponding author-nrf), Frontiera, R. R., Kortshagen, U., Kushner, M. J., Linic, S., Schatz, G. C., Andaraarachchi, H., Chaudhuri, S., Chen, H. T., Clay, C. D., Dias, T. C., Doyle, S., Jones, L. O., Meyer, M., Mueller, C. M., Nam, J. H., Raisanen, A., Rich, C. C., Srivastava, T. & Xu, C. & 2 anderen, , 21 feb. 2025, In: Journal of Chemical Physics. 162, 7, 071001.Onderzoeksoutput: Bijdrage aan tijdschrift › Artikel recenseren › peer review
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An updated set of electron-impact cross sections for CO2: untangling dissociation and application to CO2 with Ar and N2 admixtures
Liu, Y., Silva, T., Dias, T. C., Viegas, P., Zhao, X., Du, Y., He, J. & Guerra, V. (Corresponding author), 1 mrt. 2025, In: Plasma Sources Science and Technology. 34, 3, 035003.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open Access9 !!Link opens in a new tab Citaten (Scopus) -
Are local-field and local-energy approximations appropriate for modeling nanosecond discharges?
Dias, T. C. & Guerra, V. (Corresponding author), 5 mei 2025, In: Journal of Physics D: Applied Physics. 58, 18, 185204.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open Access7 !!Link opens in a new tab Citaten (Scopus) -
Controlling plasma produced fluxes to liquid surfaces by acoustic structuring: applications to plasma driven solution electrochemistry
Doyle, S. J., Dias, T. C., Meyer, M. & Kushner, M. J. (Corresponding author-nrf), 1 mrt. 2025, In: Plasma Sources Science and Technology. 34, 3, 035004.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open Access2 !!Link opens in a new tab Citaten (Scopus)