“The high-precision motion industry in general and the wafer scanning industry in particular are largely driven by linear control design. These designs inherently impose limitations in terms of control system performance, i.e. achievable bandwidths, overshoot, and settling times. Nonlinear control designs offer extra design freedom that can be used to break free from linear design limitations. This could enable future control system performances needed to support the technology roadmap in high-precision mechatronics.”

Marcel Heertjes his primary affiliation is with ASML in the role of principle engineer and control competence leader. His main research interests are with industrial control for high-precision mechatronic systems with special focus on nonlinear control, feedforward and learning control, and data-driven optimization and self-tuning. His nonlinear control contributions and developments focus on full support of frequency-domain design, synthesis, loopshaping, and qualification tools that attempt at breaking free from linear control design limitations. His primary ambition is to provide a clear view on (a) robust nonlinear control design and stability analysis, and (b) the associated data-driven controller synthesis and tuning.

Marcel Heertjes received both his MSc and PhD in mechanical engineering from Eindhoven University of Technology in 1995 and 1999, respectively. In 2000, he joined the Philips Centre for Industrial Technology in Eindhoven. In 2007 he joined ASML, Department of Mechatronic Systems Development, in Veldhoven, The Netherlands. He served as guest editor of International Journal of Robust and Nonlinear Control (2011)  and IFAC Mechatronics (2014) and currently is associate editor of IFAC Mechatronics (since 2016).