Johan P.M. Hoefnagels

2003

The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

Kessels, W. M. M., Barrell, Y., Oever, van den, P. J., Hoefnagels, J. P. M. & Sanden, van de, M. C. M., 2003, Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale: Materials Research Society, blz. 431-436 (Materials Research Society symposium proceedings; vol. 762).

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic

Time-resolved cavity ring-down spectroscopic study of the surface reactivity of Si and SiH3 plasma radicals

Hoefnagels, J. P. M., Barrell, Y., Kessels, W. M. M. & Sanden, van de, M. C. M., 2003, Proceedings of the 16th International Symposium on Plasma Chemistry. d'Agostino, R. (uitgave). Weinheim: Wiley-VCH Verlag, 5 blz.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

Time-resolved cavity ring-down spectroscopic study of the surface reactivity of Si and SiH3 plasma radicals

Hoefnagels, J. P. M., Barrell, Y., Sanden, van de, M. C. M. & Kessels, W. M. M., 2003, Frontiers in low temperature plasma diagnostics V : Villaggio Cardigliano Specchia (LE) - Italy, April 3-7, 2003 : papers. Bari, blz. 255-258

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

1 Downloads (Pure)

2002

Fast plasma deposition of thin amorphous films : in situ studies of the growth mechanism

Sanden, van de, M. C. M., Kessels, W. M. M., Hoefnagels, J. P. M., Benedikt, J., Letourneur, K. G. Y. & Schram, D. C., 2002, Thermal Plasma Deposition: symposium, Tokyo, Japan, 28 January 2002. Yoshida, T. (uitgave). Tokyo: Japan Society for the Promotion of Science (JSPS)

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

High-rate a-Si:H and μc-Si:H film growth studied by advanced plasma and in-situ diagnostics

Kessels, W. M. M., van den Oever , P. J., Hoefnagels, J. P. M., Hong, J., Houston, I. J. & Sanden, van de, M. C. M., 2002, Amorphous and heterogeneous silicon-based films, 2002 : symposium held [at the 2002 MRS spring meeting] April 2 - 5, 2002, San Francisco, California, U.S.A. Cohen, J. D. (uitgave). blz. 43-48 A25.6. (Materials Research Society Symposium Proceedings; vol. 715).

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

1 Citaat (Scopus)

32 Downloads (Pure)

Thermally deposited a-Si for solar cells

Schram, D. C., Hoefnagels, J. P. M., Kessels, W. M. M., Korevaar, B. A., Smets, A. & Sanden, van de, M. C. M., 2002, 10th International Ceramics Congress. Area A. Advanced Technical Ceramics. Section C. Ceramic powders synthesis and processing. Faenza, Italy: Techna SRL, blz. 421-432 (Advances in Science and Technology; vol. 32).

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

2 Downloads (Pure)

2001

Advanced diagnostics for exploring the growth mechanism of plasma deposited materials

Kessels, W. M. M., Hoefnagels, J. P. M., Fisher, E. R., Aydil, E. S. & van de Sanden, M. C. M., 2001, Proceedings of Frontiers in Low Temperature Plasma Diagnostics IV. Eindhoven, Netherlands: Eindhoven University of Technology, blz. 87-90

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

Advanced spectroscopic study of the densities and kinetics of SiHx radicals during high-rate plasma deposition of a-Si:H

Hoefnagels, J. P. M., Kessels, W. M. M., Stevens, A. A. E., Schram, D. C. & Sanden, van de, M. C. M., 2001, MRS Spring meeting 2001, April 16-20, San Francisco, abstracts. blz. 12

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic

Cavity ring down absorption spectroscopy : a versatile diagnostic for studies of plasma and surface chemistry processes in deposition plasmas

van de Sanden, M. C. M., Benedikt, J., Boogaarts, M. G. H., Engeln, R. A. H., Hoefnagels, J. P. M., Kessels, W. M. M., Letourneur, K. G. Y., Schram, D. C. & Smets, A. H. M., 2001, CIP'2001 proceedings : 13th International colloquium on plasma processes, June 10-14, 2001, Antibes - Juan-les-Pins, France. Paris: Société Française du Vide, blz. 43-48 (Le vide; vol. (2001), nr. Numero special).

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

Material properties and growth process of microcrystalline silcion with growth rates in excess of 1 mm/s

Hamers, E. A. G., Smets, A. H. M., Smit, C., Hoefnagels, J. P. M., Kessels, W. M. M. & Sanden, van de, M. C. M., 2001, Amorphous and heterogeneous silicon-based films - 2001 : symposium held [at the 2001 MRS spring meeting,] April 16 - 20, 2001, San Francisco, California, U.S.A. Stutzmann, M. (uitgave). Warrendale: Materials Research Society, 6 blz. (Materials Research Society Symposium Proceedings; vol. 664).

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

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9 Citaten (Scopus)

135 Downloads (Pure)

Time-resolved cavity ring down measurements for the determination of the surface and gas phase reactivity of plasma radicals

Hoefnagels, J. P. M., Stevens, A. A. E., Kessels, W. M. M. & Sanden, van de, M. C. M., 2001, Workshop on frontiers in low temperature plasma diagnostics IV : Rolduc Conference Centre, The Netherlands, 25.03.2001-29.03.2001. Stoffels, W. W. (uitgave). Eindhoven: Eindhoven University of Technology, blz. 205-208

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

1 Downloads (Pure)

Time-resolved radical measurements in a remote silane plasma using the cavity ringdown absorption technique

Hoefnagels, J. P. M., Stevens, A. A. E., Kessels, W. M. M., Schram, D. C. & Sanden, van de, M. C. M., 2001, AVS, American Vacuum Society : 48th international symposium, San Francisco, October 28-November 2, 2001 : virtual proceedings.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic

2000

Applications of cavity ring down absorption spectroscopy in the study of plasmas

Engeln, R. A. H., Letourneur, K. G. Y., Boogaarts, M. G. H., Kessels, W. M. M., Hoefnagels, J. P. M., Sanden, van de, M. C. M. & Schram, D. C., 2000, ESCAMPIG 15 - 15th Europhysics Conference on Atomic and Molecular Physics of Ionized Gases. S.l.: European Physical Society (EPS), blz. 10-13

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

Relation between growth precursors and film properties for plasma deposition of a-Si:H at rates up to 100 Å/s

Kessels, W. M. M., Smets, A. H. M., Hoefnagels, J. P. M., Boogaarts, M. G. H., Schram, D. C. & Van de Sanden, M. C. M., 1 dec. 2000, Amorphous and heterogeneous silicon thin films 2000 : symposium held [at the 2000 MRS Spring Meeting,] April 24 - 28, 2000, San Francisco, California, U.S.A. Collins, R. W. (uitgave). Warrendale, PA, USA: Materials Research Society, blz. A4.2-1/6 (Materials Research Society Symposium Proceedings; vol. 609).

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

2 Citaten (Scopus)

SiHx radical densities in a remote SiH4 plasma for high rate deposition of a-Si-H

Kessels, W. M. M., Hoefnagels, J. P. M., Boogaarts, M. G. H., Schram, D. C. & Sanden, van de, M. C. M., 2000, AVS, American Vacuum Society : 47th international symposium, Boston, October 2-6, 2000 : virtual proceedings.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic

Johan P.M. Hoefnagels

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