Onderzoeksoutput per jaar
Onderzoeksoutput per jaar
Persoonlijk profiel
Quote
The complexity of a lithographic tool, in our field requiring sub-nanometer positioning accuracy while exerting thousands of Newtons, continues to amaze. Its success requires teamwork of people in all disciplines.
Research profile
Hans Butler is a part-time professor in the Control Systems group of the Department of Electrical Engineering at Eindhoven University of Technology. He specializes in lithographic scanner control, an area of expertise he has built through a long career at ASML, where he is also a Fellow. Butler is a specialist in dynamics and control systems.
As a control engineer, Butler has worked at ASML on multiple components of lithographic tools, such as handlers, illuminators, projection systems and stages. Within ASML's Mechatronic Systems Development Department, he has led groups working on actuators, opto-mechatronics, and vibration isolation and damping. Butler is an ASML fellow with dynamics and control as main focus area, in particular in relation to the imaging process. Improving the positioning accuracy from a perspective of dynamics and control has always been the guiding interest throughout his career.
Academic background
Hans Butler holds an MSc (1986) and PhD (1990) degree from Delft University of Technology. In 1991, he joined ASML, where he has led groups working on actuators, opto-mechatronics, dynamics, vibration isolation and damping. In 2002, he became group leader of the Drives group, moving to the System Dynamics group in 2006. In 2010, Butler became an ASML fellow. In 2012 he was appointed part-time professor in Lithographic Scanner Control at Eindhoven University of Technology.
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Netwerk
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Onderzoeksoutput
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Active deformation control for a magnetically-levitated planar motor mover
Proimadis, I., Custers, C., Toth, R., Jansen, J. W., Butler, H., Lomonova, E. & Van den Hof, P. M. J., 2022, In: IEEE Transactions on Industry Applications. 58, 1, blz. 242-249 8 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
3 Downloads (Pure) -
Generalization of ILC for fixed order reference trajectories using interpolation
Bolderman, M., Erens, G., Lazar, M. & Butler, H., 11 mrt. 2022, 2022 IEEE 17th International Conference on Advanced Motion Control (AMC). Institute of Electrical and Electronics Engineers, blz. 294-299 6 blz. 9729275Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review
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On feedforward control of piezoelectric dual-stage actuator systems
Bosman Barros, C. P., Butler, H., van de Wijdeven, J. & Tóth, R., 1 feb. 2022, 60th IEEE Conference on Decision and Control (CDC 2021). Institute of Electrical and Electronics Engineers, blz. 5588-5594 7 blz. 9683598. (Proceedings of the IEEE Conference on Decision and Control; vol. 2021-December).Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review
Open AccessBestand25 Downloads (Pure) -
Physics-guided neural networks for inversion-based feedforward control applied to linear motors
Bolderman, M., Lazar, M. & Butler, H., 3 jan. 2022, CCTA 2021 - 5th IEEE Conference on Control Technology and Applications. Institute of Electrical and Electronics Engineers, blz. 1115-1120 6 blz.Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review
1 Citaat (Scopus)1 Downloads (Pure) -
On the Use of the Smith-McMillan Form in Decoupling System Dynamics
Barros, C. P. B., Butler, H. & Toth, R., 28 jul. 2021, 2021 American Control Conference (ACC). Institute of Electrical and Electronics Engineers, blz. 2069-2074 6 blz. 9483099Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review
Cursussen
Knipsels
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US Patent Issued to ASML Netherlands on April 12 for "Electron beam inspection apparatus stage positioning" (Dutch, American Inventors)
13/04/22
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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US Patent Issued to ASML Netherlands on March 8 for "Frame assembly, lithographic apparatus and device manufacturing method" (Dutch Inventors)
9/03/22
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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US Patent Issued to ASML Netherlands on March 1 for "Metrology apparatus" (Dutch Inventors)
1/03/22
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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Netherlands Patent Office Releases ASML Netherlands's Patent Application for Object Positioning System, Control System, Lithographic Apparatus, Object Positioning Method and Device Manufacturing Method
5/01/22
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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US Patent Issued to ASML Netherlands on Nov. 9 for "Pneumatic support device and lithographic apparatus with pneumatic support device" (Dutch Inventors)
10/11/21
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Pers / media: Vakinhoudelijk commentaar