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Persoonlijk profiel

Research profile

Fred Roozeboom is Full Professor in the Plasma and Materials Processing group in the Applied Physics department at Eindhoven University of Technology (TU/e). Roozeboom’s research interests include ultrathin-film technology, plasma processing, spatial ALD (including roll-to-roll), RTP, reactive ion etching, 3D passive and heterogeneous integration, microsystem technology, Li-ion microbatteries, sensors, and displays.

As Associate Professor at TU/e, Roozeboom previously led a team working on silicon-based 3D passives and Li-ion microbatteries, and heterogeneous integration into System-in-Package products in wireless communication, power management and digital signal processing. For part of this work he received the Bronze Award of the ‘NXP Invention of the Year 2007’ and became an NXP Research Fellow.

In 2009, Roozeboom left NXP and joined TNO as a senior technical advisor working in a team specializing in spatial atmospheric Atomic Layer Deposition and other high-speed processing. In 2011, the spatial processing team received the 2nd EARTO Innovation Prize Award.

As a member of The Electrochemical Society, Roozeboom serves or has served as a member-at-large of the Electronics and Photonics Division.

Academic background

Fred Roozeboom received his MSc in Chemistry (cum laude) from Utrecht University in 1976 and his PhD in Chemical Engineering in 1980 from Twente University. From 1980 to 1983, he worked on zeolite catalysis with Exxon R&D Labs, first in Baton Rouge, USA (1980 to 1982), and then with Exxon Chemicals in Rotterdam (1983). In 1983, he joined Philips Research (since 2006: NXP Research) in Eindhoven. Roozeboom became part-time professor within the Plasma & Materials Processing group in the Applied Physics department at Eindhoven University of Technology (TU/e) in 2007. He left Philips in 2009, after working on various projects there since 1983, to become Senior Technical Advisor at TNO Science & Technology.

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Onderzoeksoutput 1980 2019

2 Citaties (Scopus)

Area-selective atomic layer deposition of ZnO by area activation using electron beam-induced deposition

Mameli, A., Karasulu, B., Verheijen, M., Barcones Campo, B., Macco, B., Mackus, A., Kessels, E. & Roozeboom, F., 31 jan 2019, In : Chemistry of Materials. 31, 4, blz. 1250-1257

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Open Access
Bestand
Atomic layer deposition
Electron beams
Chemical activation
Density functional theory
Temperature

Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3

Mione, M., Engeln, R., Vandalon, V., Kessels, E. & Roozeboom, F., 21 aug 2019, In : Applied Physics Letters. 115, 8, 5 blz., 083101

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

optical emission spectroscopy
atmospheric pressure
atomic layer epitaxy
chemistry
reaction products

Infrared and optical emission spectroscopy study of the surface chemistry in atmospheric-pressure plasma-enhanced spatial ALD of Al2O3

Mione, M., Engeln, R., Vandalon, V., Kessels, E. & Roozeboom, F., 2019, In : ECS Transactions. 92, 3, blz. 35-44 10 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Optical emission spectroscopy
Surface chemistry
Atmospheric pressure
Infrared radiation
Plasmas

Preface: Silicon compatible emerging materials, processes, and technologies for advanced CMOS and post-CMOS applications 9

Roozeboom, F., Timans, P. J., Kakushima, K., Gusev, E. P., Karim, Z., Misra, D., Obeng, Y., De Gendt, S. & Jagannathan, H., 1 jan 2019, In : ECS Transactions. 89, 3, blz. III 1 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftEditorialAcademicpeer review

Open Access
4 Citaties (Scopus)

Anti-stiction coating for mechanically tunable photonic crystal devices

Petruzzella, M., Zobenica, Cotrufo, M., Zardetto, V., Mameli, A., Pagliano, F., Koelling, S., Van Otten, F. W. M., Roozeboom, F., Kessels, W. M. M., van der Heijden, R. W. & Fiore, A., 19 feb 2018, In : Optics Express. 26, 4, blz. 3882-3891 10 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Open Access
Bestand
stiction
photonics
coatings
atomic layer epitaxy
frequency modulation

Prijzen

Activiteiten 2011 2018

  • 8 Redactioneel werk
  • 2 Genodigd spreker
  • 1 Aangemelde presentatie

New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide

A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Spreker)
30 sep 20184 okt 2018

Activiteit: Types gesprekken of presentatiesAangemelde presentatieWetenschappelijk

Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma

A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Uitgenodigde spreker)
24 jul 201828 jul 2018

Activiteit: Types gesprekken of presentatiesGenodigd sprekerWetenschappelijk

lnZnO grown by atmospheric plasma-enhanced spatial atomic layer deposition for application in high-mobility TFT circuits

F. Roozeboom (Spreker)
2 jul 20176 jul 2017

Activiteit: Types gesprekken of presentatiesGenodigd sprekerWetenschappelijk

ECS Transactions (Tijdschrift)

Fred Roozeboom (Redacteur)
17 mei 2017

Activiteit: Types publicaties van collegiale toetsing en redactioneel werkRedactioneel werkWetenschappelijk

ECS Transactions (Tijdschrift)

Fred Roozeboom (Redacteur)
6 okt 2016

Activiteit: Types publicaties van collegiale toetsing en redactioneel werkRedactioneel werkWetenschappelijk

Pers/media

The creation of the modern laptop

Peter Notten & Fred Roozeboom

16/06/15

1 item van media-aandacht

Pers / media: Vakinhoudelijk commentaar

Scriptie

Atomic layer deposition of In2O3: growth, morphology and hydrogen doping

Auteur: Vanhemel, D., 31 mrt 2015

Begeleider: Wu, Y. (Afstudeerdocent 1), Roozeboom, F. (Afstudeerdocent 2) & Kessels, W. (Afstudeerdocent 2)

Scriptie/masterproef: Master

Bestand

Plasma-assisted ALD of TiN/Al2O3 stacks for MOS trench capacitor applications

Auteur: Hoogeland, D., 31 dec 2008

Begeleider: Kessels, W. (Afstudeerdocent 1), Roozeboom, F. (Externe coach), Jinesh, K. (Externe persoon) (Externe coach) & Besling, W. (Externe persoon) (Externe coach)

Scriptie/masterproef: Master

Bestand

Through-wafer vias for system in package devices

Auteur: Yildirim, O., 31 dec 2006

Begeleider: Karouta, F. (Afstudeerdocent 1), Roozeboom, F. (Afstudeerdocent 2), Klootwijk, J. (Externe persoon) (Afstudeerdocent 2) & Dekkers, W. (Externe persoon) (Afstudeerdocent 2)

Scriptie/masterproef: Master

Bestand