Als u wijzigingen in Pure hebt gemaakt, zullen deze hier binnenkort zichtbaar zijn.

Persoonlijk profiel

Research profile

“Today’s computer chip components have dimensions of the order of nanometers, and existing chip fabrication technology is limited. New technologies are needed for component production at an increasingly smaller scale.”

Research profile

Adrie Mackus is Assistant Professor in the Plasma and Materials Processing group within the Applied Physics department at Eindhoven University of Technology (TU/e). He researches atomic layer deposition (ALD) of platinum, from surface reactions to nanopatterning.  Mackus researches a form of ALD in which the locations of the atoms to be deposited are controlled precisely. This allows the component to be formed solely at the point where it is required, which means there is no longer any need to remove unwanted material by etching. Mackus investigates chemical reactions that arise at the surface of the material in ALD of platinum. This knowledge can be used in making electrical contacts on highly sensitive nanomaterials, such as carbon nanotubes and graphene.

Mackus covers the field of thin film deposition by atomic layer deposition for applications in nanoelectronics, with a focus on area-selective deposition and on the investigation of the underlying reaction mechanisms.

Mackus has authored or otherwise contributed to 5 conference publications 36 peer-reviewed journal articles.

Academic background

Adrie Mackus earned his M.Sc. and Ph.D. degrees (both cum laude) in Applied Physics at Eindhoven University of Technology TU/e in 2009 and 2013, respectively. His doctoral thesis work “Atomic Layer Deposition of Platinum: From Surface Reactions to Nanopatterning” was carried out in close collaboration with the company FEI Electron Optics, and included a visit to Purdue University, USA in 2012.  Mackus worked as a postdoctoral researcher at the department of Chemical Engineering at Stanford University from 2014 to 2016, for which he received a personal NWO Rubicon grant in 2014. At Stanford, he focused on the study of the atomic layer deposition (ALD) of ternary materials using in-situ techniques. After his postdoc, Mackus returned to TU/e in 2016 as Assistant Professor. 

Vingerafdruk Duik in de onderzoeksthema's waar Adrie J.M. Mackus actief is. Deze onderwerplabels komen voort uit het werk van deze persoon. Samen vormen ze een unieke vingerafdruk.

  • 5 Vergelijkbare profielen
Atomic layer deposition Chemische stoffen
atomic layer epitaxy Fysica en Astronomie
Platinum Chemische stoffen
electron beams Fysica en Astronomie
Plasmas Chemische stoffen
Metals Chemische stoffen
purity Fysica en Astronomie
Surface reactions Chemische stoffen

Netwerk Recente externe samenwerking op landenniveau. Duik in de details door op de stippen te klikken.

Onderzoeksoutput 2007 2019

3 Citaties (Scopus)
31 Downloads (Pure)

Area-selective atomic layer deposition of ZnO by area activation using electron beam-induced deposition

Mameli, A., Karasulu, B., Verheijen, M., Barcones Campo, B., Macco, B., Mackus, A., Kessels, E. & Roozeboom, F., 26 feb 2019, In : Chemistry of Materials. 31, 4, blz. 1250-1257 8 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Open Access
Bestand
Atomic layer deposition
Electron beams
Chemical activation
Density functional theory
Temperature
50 Downloads (Pure)

Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

Vos, M. F. J., Chopra, S. N., Verheijen, M. A., Ekerdt, J. G., Agarwal, S., Kessels, W. M. M. & Mackus, A. J. M., 22 mei 2019, In : Chemistry of Materials. 31, 11, blz. 3878-3882 5 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Open Access
Bestand
15 Citaties (Scopus)
203 Downloads (Pure)

From the bottom-up: toward area-selective atomic layer deposition with high selectivity

Mackus, A. J. M., Merkx, M. J. M. & Kessels, W. M. M., 8 jan 2019, In : Chemistry of Materials. 31, 1, blz. 2-12 11 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Open Access
Bestand
Atomic layer deposition
Level control
Processing
Nanotechnology
Etching
11 Citaties (Scopus)
2 Downloads (Pure)

Synthesis of doped, ternary, and quaternary materials by atomic layer deposition: a review

Mackus, A., Schneider, J. R., MacIsaac, C., Baker, J. G. & Bent, S. F., 26 feb 2019, In : Chemistry of Materials. 31, 4, blz. 1142-1183 42 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Atomic layer deposition
Nucleation
Thin films
Nanoelectronics
Oxides
2 Citaties (Scopus)
1 Downloads (Pure)

Approaches and opportunities for area-selective atomic layer deposition

Mackus, A. J. M., 3 jul 2018, 2018 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2018. Piscataway: Institute of Electrical and Electronics Engineers, 2 blz. 8403864

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

Atomic layer deposition
atomic layer epitaxy
Fabrication
fabrication
Processing

Prijzen

Paul H. Holloway Award

Adrie Mackus (Ontvanger), 22 okt 2019

Prijs: AndersWerk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.)Wetenschappelijk

Activiteiten 2018 2018

  • 2 Genodigd spreker
  • 1 Aangemelde presentatie

New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide

A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Spreker)
30 sep 20184 okt 2018

Activiteit: Types gesprekken of presentatiesAangemelde presentatieWetenschappelijk

Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma

A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Uitgenodigde spreker)
24 jul 201828 jul 2018

Activiteit: Types gesprekken of presentatiesGenodigd sprekerWetenschappelijk

Overview of approaches for achieving area-selective ALD

A.J.M. Mackus (Uitgenodigde spreker)
29 apr 20181 mei 2018

Activiteit: Types gesprekken of presentatiesGenodigd sprekerWetenschappelijk

Cursussen

Applied natural sciences formal

1/09/12 → …

Cursus

Electromagnetism

1/09/12 → …

Cursus

Impacten

Advanced ALD technologies

M. (Adriana) Creatore (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker), Adrie J.M. Mackus (Onderzoeker)

Impact: Research Topic/Theme (at group level)

Future nanoelectronics and nanopatterning

Ageeth A. Bol (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker), Adrie J.M. Mackus (Content manager)

Impact: Research Topic/Theme (at group level)

Scriptie

Atomic layer deposition and electron beam induced deposition as nanomanufacturing tools for the fabrication of carbon nanotube contacts

Auteur: Dielissen, S., 31 aug 2011

Begeleider: Mackus, A. (Afstudeerdocent 1), Fernández Landaluce, T. (Externe coach) & Kessels, W. (Afstudeerdocent 2)

Scriptie/masterproef: Master

Bestand

Atomic layer deposition of Pt and its combination with electron beam induced deposition for the fabrication of nanostructures

Auteur: Mackus, A., 30 apr 2009

Begeleider: Knoops, H. (Afstudeerdocent 1), Mulders, J. (Externe coach) & Kessels, W. (Afstudeerdocent 2)

Scriptie/masterproef: Master

Bestand

Direct-write atomic layer deposition for the fabrication of carbon nanotube field-effect transistors

Auteur: Thissen, N., 31 okt 2012

Begeleider: Mackus, A. (Afstudeerdocent 1), Bol, A. (Afstudeerdocent 2) & Kessels, W. (Afstudeerdocent 2)

Scriptie/masterproef: Master

Bestand

Optimization of platinum atomic layer deposition on the FlexAL setup

Auteur: van Stiphout, T., 2013

Begeleider: Mackus, A. (Afstudeerdocent 1) & Bol, A. (Afstudeerdocent 2)

Scriptie/masterproef: Bachelor

Bestand