Adriaan J.M. Mackus is Associate Professor in the Plasma and Materials Processing group within the Applied Physics department at Eindhoven University of Technology (TU/e). His research encompasses thin film deposition and etching for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication.  

Adrie Mackus earned his M.Sc. and Ph.D. degrees (both with highest honors) in Applied Physics from TU/e in 2009 and 2013, respectively. Adrie worked as a postdoc at the department of Chemical Engineering at Stanford University in 2014-2016. He returned to TU/e in 2016, where he received tenure in 2019. His current research encompasses atomic layer deposition (ALD) and etching (ALE) for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication. This involves application-oriented projects funded by industrial partners, as well as fundamental studies of the underlying mechanisms using in-situ techniques. Adrie chaired the 2^nd Area Selective Deposition workshop (ASD2017) in Eindhoven in 2017. In 2020 he was awarded a VIDI grant from the Netherlands Organization of Scientific Research (NWO) and a Starting Grant from the European Research Council (ERC).