Projecten per jaar
Organisatieprofiel
Introductie / missie
Driven by Moore’s scaling law and the transition to a sustainable society there is an enormous push to develop nanomaterials for novel device architectures and for device concepts with new functionalities. In order to study new nanomaterials systematically and later implement them into devices, new synthesis processes and techniques need to be investigated and developed, that are reliable, reproducible and scalable with ultimate control at the nanoscale.
Highlighted phrase
Synthesis and integration of 2-D nanomaterials
Over de organisatie
In our group we pioneer atomic layer deposition (ALD) for 2D nanomaterials synthesis. ALD is a scalable, low temperature preparation method for thin films which offers precise thickness control down to the sub-monolayer and can therefore be instrumental for the large area synthesis of 2D materials. The current focus of the group is on ALD of 2D transition metal dichalcogenides (2D-TMDs) for (opto)electronics and catalysis. We use plasma chemistry (plasma-enhanced ALD, PEALD) to control functionalities of the 2D-TMDs, such as morphology, materials phase and stoichiometry. Furthermore, by doping, alloying and by the formation of heterostructures we tune the electrical properties of the 2D TMDs, such as the charge carrier concentration and band gap.
Our process development goes hand-in-hand with obtaining understanding of the ALD reaction mechanisms at play using for example high-resolution transmission electron microscopy and DFT simulations.
Vingerafdruk
Netwerk
Profielen
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Jeff J.P.M. Schulpen
- Applied Physics and Science Education, Processing of low-dimensional nanomaterials
- Applied Physics and Science Education, Plasma & Materials Processing - Promovendus
Persoon: Prom. : Promovendus, Prom. : Promovendus
projecten
- 1 Afgelopen
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3DAM
Kessels, W. M. M., Vandalon, V., van Bommel, C., Shirazi, M., Faraz, T. & Schulpen, J. J. P. M.
1/04/16 → 1/04/19
Project: Onderzoek direct
Onderzoeksoutput
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Computational investigation of precursor blocking during area-selective atomic layer deposition using aniline as a small molecule inhibitor
Tezsevin, I., Maas, J. F. W., Merkx, M. J. M., Lengers, R., Kessels, W. M. M., Sandoval, T. E. & Mackus, A. J. M., 15 mrt. 2023, (E-publicatie vóór gedrukte publicatie) In: Langmuir. XX, XOnderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open Access -
Atomic layer deposition of conductive and semiconductive oxides
Macco, B. & Kessels, W. M. M., 1 dec. 2022, In: Applied Physics Reviews. 9, 4, 34 blz., 041313.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand1 Citaat (Scopus)35 Downloads (Pure) -
Atomic layer deposition of GdF3thin films
Atosuo, E., Mizohata, K., Mattinen, M., Mäntymäki, M., Vehkamäki, M., Leskelä, M. & Ritala, M., 1 mrt. 2022, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 40, 2, 8 blz., 022402.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand2 Citaten (Scopus)85 Downloads (Pure)
Activiteiten
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Plasma-assisted atomic layer deposition: from basics to applications
W.M.M. (Erwin) Kessels (Spreker)
10 feb. 2021Activiteit: Types gesprekken of presentaties › Keynote spreker › Wetenschappelijk
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SALD (Externe organisatie)
W.M.M. (Erwin) Kessels (Voorzitter)
17 sep. 2020 → 31 dec. 2023Activiteit: Types lidmaatschap › Lidmaatschap van bestuur › Professioneel
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New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer) & F. Roozeboom (Spreker)
30 sep. 2018 → 4 okt. 2018Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
Knipsels
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New Academy of Finland Postdoctoral Researchers Selected in Natural Sciences and Engineering Research
Miika Mattinen
13/05/22
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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Findings from Eindhoven University of Technology in the Area of Hydrogen Reported (Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible...
Ageeth A. Bol
7/04/17
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
Scripties/Masterproeven
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Characterization of Intrinsic and Aluminum-doped ZnO Deposited by Spatial ALD
Auteur: Broekema, T. M. P., 22 sep. 2021Begeleider: Macco, B. (Afstudeerdocent 1), van de Loo, B. W. H. (Externe coach) & Kessels, W. M. M. (Afstudeerdocent 2)
Scriptie/Masterproef: Master
Bestand -
Plasma-Enhanced Atomic Layer Deposition of Superconducting Tantalum Carbonitride for Quantum Devices
Auteur: Peeters, S. A., 2022Begeleider: Knoops, H. C. M. (Afstudeerdocent 1) & Kessels, W. M. M. (Afstudeerdocent 2)
Scriptie/Masterproef: Master
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Synthesis & characterization of two-dimensional transition metal dichalcogenide alloys: NbxW1−xS2
Auteur: Lam, C. H. X., 2022Begeleider: Schulpen, J. J. P. M. (Afstudeerdocent 1) & Bol, A. A. (Afstudeerdocent 2)
Scriptie/Masterproef: Master
Bestand