!!Projects per year
Organisatieprofiel
Introductie / missie
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Organisatieprofiel
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
Vingerafdruk
Samenwerkingen en hoofdonderzoeksgebieden uit de afgelopen vijf jaar
Profielen
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Caspar van Bommel
- Applied Physics and Science Education, Plasma & Materials Processing - Technicus O&O Ontwikkeling
Persoon: OBP : Ondersteunend en Beheerspersoneel
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Iron-Oxide Reduction via Hydrogen Plasmas
Meijer, T. (Projectmedewerker), Wubs, J. R. (Project deelnemer) & Held, J. (Project Manager)
1/09/25 → 31/08/29
Project: First tier
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PMP: Nieuwe materialen voor hoog-temperatuur PICs, nano-gestructureerde oppervlakken, meta-surfaces , nieuwe golflengtes
Macco, B. (Project Manager), Theeuwes, R. J. (Projectmedewerker), Massaro, L. (Projectmedewerker) & Kessels, W. M. M. (Projectmedewerker)
1/01/23 → 12/12/28
Project: Third tier
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DAC Maturation
Creatore, M. (Project Manager), van Bommel, C. (Projectmedewerker), van der Hagen, D. (Project communicatie medewerker), Sonar, S. (Projectmedewerker) & Zeebregts, J. (Projectmedewerker)
15/04/22 → 29/02/24
Project: Onderzoek direct
Onderzoeksoutput
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Advancing Spatial Atomic Layer Deposition for More Materials and More Demanding Applications
van de Poll, M. L., 11 jun 2026, Eindhoven: Eindhoven University of Technology. 183 blz.Onderzoeksoutput: Scriptie › Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)
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Analysis of InGaAsP Multi-Quantum Wells Directly Grown on InP-on-Si Wafers for Photonic Integration
Lin, J., Kapoor, A. (Corresponding author-nrf), Verheijen, M. A. (Corresponderende auteur), Dolores Calzadilla, V. M. (Corresponderende auteur), Williams, K. A. (Corresponderende auteur) & Jiao, Y. (Corresponderende auteur), 20 mei 2026, 2026 IEEE Silicon Photonics Conference, SiPhotonics. Institute of Electrical and Electronics Engineers, 2 blz. 11520765Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review
Open AccessBestand55 Downloads (Pure) -
Atomic Layer Etching of Nickel Using N2/H2 Plasma Exposure and Hexafluoroacetylacetone
Mohamed Ali, A. (Corresponding author), Krieger, G. F., Soulié, J.-P., Knoops, H., Kessels, W. M. M., De Gendt, S., Kundu, S. & de Marneffe, J.-F., 12 mei 2026, In: ACS Applied Electronic Materials. 8, 9, blz. 3834-3842 9 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Uitrusting
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Ceramic Cascade Arch
van de Sanden , M. C. M. (Manager)
Plasma & Materials ProcessingUitrusting/faciliteit: Uitrusting
Datasets
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Nanosecond Repetitively Pulsed Plasmas with MHz Bursts for CO2 Dissociation
Budde, M. (Ontwerper), Zenodo, 27 nov. 2023
DOI: 10.5281/zenodo.10209531, https://zenodo.org/records/10209531
Dataset
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Dataset 2
Philpott, H. (Ontwerper), Garcia-Caurel, E. (Ontwerper), Guaitella, O. (Ontwerper) & Sobota, A. (Ontwerper), Optica Publishing Group, 20 okt. 2021
DOI: 10.6084/m9.figshare.16592753, https://opticapublishing.figshare.com/articles/dataset/Dataset_2/16592753
Dataset
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Dataset 1
Philpott, H. (Ontwerper), Garcia-Caurel, E. (Ontwerper), Guaitella, O. (Ontwerper) & Sobota, A. (Ontwerper), Optica Publishing Group, 20 okt. 2021
DOI: 10.6084/m9.figshare.16592744, https://opticapublishing.figshare.com/articles/dataset/Dataset_1/16592744
Dataset
Prijzen
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1st place ALD Poster Award
de Jong, A. A. (Ontvanger), 6 aug. 2024
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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2nd prize student award competition
Macco, B. (Ontvanger), 26 jul. 2016
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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ALD 2025 dr. Tuomo Suntola Best Student Oral Presentation
Poupaki, E. (Ontvanger), 25 jun. 2025
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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16th Frontiers in Low Temperature Plasma Diagnostics (FLTPD) conference
Sobota, A. (Voorzitter), Peeters, A. (Organisator), Nijdam, S. (Organisator), Wubs, J. R. (Organisator), Held, J. (Organisator), Engeln, R. A. H. (Organisator) & van Rooij, G. J. (Organisator)
12 apr 2026 → 16 apr 2026Activiteit: Types deelname aan of organisatie van een evenement › Congres › Wetenschappelijk
Bestand -
International Atomic Layer Etching Workshop (Evenement)
Knoops, H. C. M. (Lid)
2026 → …Activiteit: Types lidmaatschap › Lidmaatschap van commissie › Wetenschappelijk
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ALD for Industry (Evenement)
Knoops, H. C. M. (Lid)
2025 → …Activiteit: Types lidmaatschap › Lidmaatschap van commissie › Wetenschappelijk
Knipsels
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Verliert Comet den Anschluss an die nächste Halbleitergeneration?
7/07/25
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Bedrijf van Matthijs (29) haalt 20 miljoen binnen voor maken van supercomputer: 'Gaat wereld veranderen'
6/03/25
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Hoe zorgt nano-technologie voor steeds kleinere en betere computerchips?
20/02/25
1 Mediabijdrage
Pers / media: PR activiteiten
Impacts
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Advanced ALD technologies
Creatore, A. (Onderzoeker), Kessels, E. (Onderzoeker) & Mackus, A. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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CO2 neutral fuels
Engeln, R. (Onderzoeker) & Kessels, E. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
Scripties/Masterproeven
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µ-Plasma assisted deposition of titanium dioxide thin films
Verheyen, J. (Auteur), Creatore, M. (Afstudeerdocent 1), Aghaee, M. (Afstudeerdocent 2) & Stevens, A. A. E. (Externe coach), 2017Scriptie/Masterproef: Master
Bestand -
Ab-initio insights into the tunability of the electronic structure in transition metal dichalcogenide alloys grown by atomic layer deposition
Schulpen, J. J. P. M. (Auteur), Vandalon, V. (Afstudeerdocent 1) & Bol, A. A. (Afstudeerdocent 2), 2018Scriptie/Masterproef: Master
Bestand -
Absolute Atomic Hydrogen Densities in Low Pressure Electron Cyclotron Resonance Plasmas measured using Optical Emission Spectroscopy
van Deudekom, S. F. (Auteur), Nijdam, S. (Afstudeerdocent 1), Engeln, R. A. H. (Afstudeerdocent 2) & van der Horst, R. M. (Externe coach), mrt 2024Scriptie/Masterproef: Master
Bestand