Projecten per jaar
Organisatieprofiel
Introductie / missie
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Organisatieprofiel
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
Vingerafdruk
Samenwerkingen en hoofdonderzoeksgebieden uit de afgelopen vijf jaar
Profielen
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Willem-Jan H. Berghuis, MSc
- Applied Physics and Science Education, Plasma & Materials Processing - Onderzoeker
- Applied Physics and Science Education, Atomic scale processing
- Mechanical Engineering, Group Den Toonder - Onderzoeker
Persoon: Prom. : Promovendus, OWP : Docent / Onderzoeker
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Sample Runs
Kessels, W. M. M. (Project Manager) & Kessels, W. M. M. (Project Manager)
1/03/22 → 30/06/25
Project: Third tier
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DAC Maturation
Creatore, M. (Project Manager), van Bommel, C. (Projectmedewerker), van der Hagen, D. (Project communicatie medewerker), Sonar, S. (Projectmedewerker) & Zeebregts, J. (Projectmedewerker)
15/04/22 → 29/02/24
Project: Onderzoek direct
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Metal Oxides: Maturing of an Efficient Novel Technology Upgrade for PV-Manufacturing
Kessels, W. M. M. (Project Manager), Koushik, D. (Projectmedewerker) & Theeuwes, R. J. (Projectmedewerker)
1/02/20 → 30/06/22
Project: Onderzoek direct
Onderzoeksoutput
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3D electrode surface engineering via atomic layer deposition of nickel oxide for improved water oxidation performance
Haghverdi Khamene, S. (Corresponding author), Creatore, M. & Tsampas, M. (Corresponding author-nrf), mei 2025, In: Chemical Engineering Journal Advances. 22, 14 blz., 100723.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand12 Downloads (Pure) -
Contact Resistance Optimization in MoS2 Field-Effect Transistors through Reverse Sputtering-Induced Structural Modifications
Fa, Y., Piacentini, A., Macco, B., Kalisch, H., Heuken, M., Vescan, A., Wang, Z. (Corresponding author) & Lemme, M. C. (Corresponding author), 23 apr. 2025, In: ACS Applied Materials & Interfaces. 17, 16, blz. 24526-24534 9 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand1 Downloads (Pure) -
Dimension Control of Hexagonal SiGe Single Branched Nanowires
Lamon, D., van der Donk, H. A. J., Verheijen, M. A., Jansen, M. M. & Bakkers, E. P. A. M. (Corresponding author), 9 apr. 2025, In: Nano Letters. 25, 14, blz. 5741-5746 6 blz., 5c00267.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand1 Citaat (Scopus)1 Downloads (Pure)
Uitrusting
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Ceramic Cascade Arch
van de Sanden , M. C. M. (Manager)
Plasma & Materials ProcessingUitrusting/faciliteit: Uitrusting
Datasets
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Universal Platform for Scalable Semiconductor-Superconductor Nanowire Networks
Jung, J. (Bijdrager), Op het Veld, R. L. M. (Bijdrager), Benoist, R. (Bijdrager), Verheijen, M. A. (Bijdrager), Manders, C. (Bijdrager) & Bakkers, E. P. A. M. (Bijdrager), Zenodo, 13 mei 2021
DOI: 10.5281/zenodo.4758551, https://zenodo.org/record/4758551
Dataset
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OES toolbox
Held, J. (Ontwerper), Zenodo, 20 dec. 2024
DOI: 10.5281/zenodo.13986864, https://oes-toolbox.com/ en nog één link, https://github.com/Julian-Held/OES-toolbox (minder tonen)
Dataset: Software
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Data underlying the publication: Time-resolved optical emission spectroscopy in CO2 nanosecond pulsed discharges
Salden, T. P. W. (Eigenaar), Martini, L. M. (Eigenaar), Ceppelli, M. (Eigenaar), Tosi, M. P. (Eigenaar) & Dilecce, G. (Ontwerper), Eindhoven University of Technology, 25 jul. 2022
DOI: 10.4121/20254665
Dataset
Prijzen
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1st place ALD Poster Award
de Jong, A. A. (Ontvanger), 6 aug. 2024
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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2nd prize student award competition
Macco, B. (Ontvanger), 26 jul. 2016
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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ALD Best Student Paper Award
Schulpen, J. J. P. M. (Ontvanger), 29 jun. 2020
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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POx/Al2O3 stacks for surface passivation of Si and InP
Theeuwes, R. J. (Spreker)
10 mei 2022Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
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Excellent Surface Passivation of n+-doped Silicon by POx/Al2O3 Stacks with High Positive Fixed Charge Density
Theeuwes, R. J. (Spreker)
9 mei 2022Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
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2022 MRS Spring Meeting & Exhibit, May 8-13, 2022, Honolulu, Hawai'i, May 23-25, 2022, Virtual
Theeuwes, R. J. (Deelnemer)
8 mei 2022 → 13 mei 2022Activiteit: Types deelname aan of organisatie van een evenement › Congres › Wetenschappelijk
Knipsels
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Bedrijf van Matthijs (29) haalt 20 miljoen binnen voor maken van supercomputer: 'Gaat wereld veranderen'
6/03/25
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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Hoe zorgt nano-technologie voor steeds kleinere en betere computerchips?
20/02/25
1 Mediabijdrage
Pers / media: PR activiteiten
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Technische Universiteit Eindhoven gaat ‘twee keer zoveel studenten opleiden’ voor de chipsector
27/07/24
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
Impacts
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Advanced ALD technologies
Creatore, M. (Onderzoeker), Kessels, W. M. M. (Onderzoeker) & Mackus, A. J. M. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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CO2 neutral fuels
Engeln, R. A. H. (Onderzoeker) & Kessels, W. M. M. (Onderzoeker)
Impact: Research Topic/Theme (at group level)
Scripties/Masterproeven
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µ-Plasma assisted deposition of titanium dioxide thin films
Verheyen, J. (Auteur), Creatore, M. (Afstudeerdocent 1), Aghaee, M. (Afstudeerdocent 2) & Stevens, A. A. E. (Externe coach), 2017Scriptie/Masterproef: Master
Bestand -
Ab-initio insights into the tunability of the electronic structure in transition metal dichalcogenide alloys grown by atomic layer deposition
Schulpen, J. J. P. M. (Auteur), Vandalon, V. (Afstudeerdocent 1) & Bol, A. A. (Afstudeerdocent 2), 2018Scriptie/Masterproef: Master
Bestand -
Absolute Atomic Hydrogen Densities in Low Pressure Electron Cyclotron Resonance Plasmas measured using Optical Emission Spectroscopy
van Deudekom, S. F. (Auteur), Nijdam, S. (Afstudeerdocent 1), Engeln, R. A. H. (Afstudeerdocent 2) & van der Horst, R. M. (Externe coach), mrt. 2024Scriptie/Masterproef: Master
Bestand