Projecten per jaar
Organisatieprofiel
Introductie / missie
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Over de organisatie
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
Vingerafdruk
Netwerk
Profielen
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Willem-Jan H. Berghuis, MSc
- Applied Physics and Science Education, Atomic scale processing
- Applied Physics and Science Education, Plasma & Materials Processing - Postdoc
Persoon: Prom. : Promovendus, PD : Postdoc
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DAC Maturation
Creatore, M., van Bommel, C., van der Hagen, D. & Sonar, S.
15/04/22 → 29/02/24
Project: Onderzoek direct
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Metal Oxides: Maturing of an Efficient Novel Technology Upgrade for PV-Manufacturing
Kessels, W. M. M., Koushik, D. & Theeuwes, R. J.
1/02/20 → 30/06/22
Project: Onderzoek direct
Onderzoeksoutput
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After enabling AI it is time for the plasma community to benefit from AI
Kessels, W. M. M., 12 apr. 2023, In: ILTPC Newsletter. 31, blz. 4 1 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Professioneel
Open AccessBestand -
Aging and passivation of magnetic properties in Co/Gd bilayers
Kools, T. J., Hees, Y. L. W. V., Poissonnier, K., Li, P., Campo, B. B., Verheijen, M. A., Koopmans, B. & Lavrijsen, R., 30 mei 2023.Onderzoeksoutput: Werkdocument › Preprint › Professioneel
Bestand -
Carrier-selective contacts using metal compounds for crystalline silicon solar cells
Ibarra Michel, J., Dréon, J., Boccard, M., Bullock, J. & Macco, B., apr. 2023, In: Progress in Photovoltaics: Research and Applications. 31, 4, blz. 380-413 34 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Artikel recenseren › peer review
Open AccessBestand12 Citaten (Scopus)19 Downloads (Pure)
Uitrusting
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Ceramic Cascade Arch
M.C.M. (Richard) van de Sanden (Manager)
Plasma & Materials ProcessingUitrusting/faciliteit: Uitrusting
Datasets
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Data underlying the publication: Time-resolved optical emission spectroscopy in CO2 nanosecond pulsed discharges
Salden, T. P. W. (Eigenaar), Martini, L. M. (Eigenaar), Ceppelli, M. (Eigenaar), Tosi, M. P. (Eigenaar) & Dilecce, G. (Ontwerper), Eindhoven University of Technology, 25 jul. 2022
DOI: 10.4121/20254665
Dataset
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Optimizing Mueller Polarimetry in Noisy Systems Through Over-determination
Philpott, H. (Ontwerper), Garcia-Caurel, E. (Ontwerper), Guaitella, O. (Ontwerper) & Sobota, A. (Ontwerper), Optica Publishing Group, 20 okt. 2021
DOI: 10.6084/m9.figshare.c.5610995
Dataset
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Growth - related formation mechanism of I3 - type basal stacking fault in epitaxially grown hexagonal Ge - 2H
Vincent, L. (Ontwerper), Fadaly, E. (Ontwerper), Renard, C. (Ontwerper), Peeters, W. H. J. (Ontwerper), Vettori, M. (Ontwerper), Panciera, F. (Ontwerper), Bouchier, D. (Ontwerper), Bakkers, E. P. A. M. (Ontwerper) & Verheijen, M. A. (Ontwerper), Zenodo, 30 okt. 2021
Dataset
Prijzen
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2nd prize student award competition
Macco, Bart (Ontvanger), 26 jul. 2016
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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3D nanostructures for miniature electronics
Mackus, Adrie J.M. (Ontvanger), 1 jan. 2020
Prijs: ERC › Starting › Wetenschappelijk
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ALD Best Student Paper Award
Schulpen, Jeff J.P.M. (Ontvanger), 29 jun. 2020
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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POx/Al2O3 stacks for surface passivation of Si and InP
Roel J. Theeuwes (Spreker)
10 mei 2022Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
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Excellent Surface Passivation of n+-doped Silicon by POx/Al2O3 Stacks with High Positive Fixed Charge Density
Roel J. Theeuwes (Spreker)
9 mei 2022Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
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2022 MRS Spring Meeting & Exhibit, May 8-13, 2022, Honolulu, Hawai'i, May 23-25, 2022, Virtual
Roel J. Theeuwes (Deelnemer)
8 mei 2022 → 13 mei 2022Activiteit: Types deelname aan of organisatie van een evenement › Congres › Wetenschappelijk
Knipsels
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Eindhoven University of Technology Researcher Provides New Data on Atomic Layer Deposition (Control by atomic layer deposition over the chemical composition of nickel cobalt oxide for the oxygen evolution reaction)
Marcel A. Verheijen & Renée van Limpt
12/05/23
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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Research from Eindhoven University of Technology Has Provided New Data on Applied Physics (Enhancing all-optical switching of magnetization by He ion irradiation)
Marcel A. Verheijen & Julian Hintermayr
11/11/22
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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2D TMD Materials Enabling Future Electronics
Shashank Balasubramanyam, Marc J.M. Merkx, Marcel A. Verheijen, W.M.M. (Erwin) Kessels, Adrie J.M. Mackus & Ageeth A. Bol
27/06/21
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
Impacts
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Advanced ALD technologies
M. (Adriana) Creatore (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker) & Adrie J.M. Mackus (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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CO2 neutral fuels
Richard A.H. Engeln (Onderzoeker) & W.M.M. (Erwin) Kessels (Onderzoeker)
Impact: Research Topic/Theme (at group level)
Scripties/Masterproeven
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µ-Plasma assisted deposition of titanium dioxide thin films
Auteur: Verheyen, J., 2017Begeleider: Creatore, M. (Afstudeerdocent 1), Aghaee, M. (Afstudeerdocent 2) & Stevens, A. A. E. (Externe coach)
Scriptie/Masterproef: Master
Bestand -
Ab-initio insights into the tunability of the electronic structure in transition metal dichalcogenide alloys grown by atomic layer deposition
Auteur: Schulpen, J. J. P. M., 2018Begeleider: Vandalon, V. (Afstudeerdocent 1) & Bol, A. A. (Afstudeerdocent 2)
Scriptie/Masterproef: Master
Bestand -
Adding H2O to CO2 in a dielectric-barrier discharge
Auteur: Rompelberg, R. M. H., 2017Begeleider: Engeln, R. A. H. (Afstudeerdocent 1), Klarenaar, B. L. M. (Afstudeerdocent 2) & Damen, M. A. (Afstudeerdocent 2)
Scriptie/Masterproef: Bachelor
Bestand