Projecten per jaar
Organisatieprofiel
Introductie / missie
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Over de organisatie
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
Vingerafdruk
Netwerk
Profielen
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Karsten Arts, MSc
- Applied Physics, Atomic scale processing
- Applied Physics, Plasma & Materials Processing - Onderzoeker
Persoon: OWP : Docent / Onderzoeker, OWP : Docent / Onderzoeker
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Shashank Balasubramanyam
- Applied Physics, Plasma & Materials Processing - Onderzoeker
Persoon: OWP : Docent / Onderzoeker
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Saravana Balaji Basuvalingam
- Applied Physics, Atomic scale processing
- Applied Physics, Plasma & Materials Processing - Onderzoeker
Persoon: OWP : Docent / Onderzoeker, PD : Postdoc
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3DAM
Kessels, W. M. M., Vandalon, V., van Bommel, C., Shirazi, M., Faraz, T. & Schulpen, J. J. P. M.
1/04/16 → 1/04/19
Project: Onderzoek direct
Onderzoeksoutput
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Absolute OH density measurements in a CO2-H2O glow discharge by laser-induced fluorescence spectroscopy
Budde, M., Martini, L. M., Ceppelli, M., Quercetti, S. & Engeln, R. A. H., 17 mrt. 2022, (Geaccepteerd/In druk) In: Plasma Sources Science and Technology. XX, XOnderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open Access -
Area-selective atomic layer deposition using small molecule inhibitors
Merkx, M. J. M., 22 feb. 2022, Eindhoven: Eindhoven University of Technology. 234 blz.Onderzoeksoutput: Scriptie › Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)
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Atomic layer deposition for Li-ion batteries: Novel chemistries, surface reactions and film properties
Hornsveld, N., 26 jan. 2022, Eindhoven: Eindhoven University of Technology. 205 blz.Onderzoeksoutput: Scriptie › Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)
Open AccessBestand
Uitrusting
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Ceramic Cascade Arch
M.C.M. (Richard) van de Sanden (Manager)
Plasma & Materials ProcessingUitrusting/faciliteit: Uitrusting
Prijzen
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2nd prize student award competition
Macco, Bart (Ontvanger), 26 jul. 2016
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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ALD Best Student Paper Award
Vos, M. (Ontvanger), 23 jul. 2019
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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ALD Best Student Paper Award
Schulpen, Jeff J.P.M. (Ontvanger), 29 jun. 2020
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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12th International Conference on Crystalline Silicon Photvoltaics 2022
Roel J. Theeuwes (Deelnemer)
28 mrt. 2022 → 30 mrt. 2022Activiteit: Types deelname aan of organisatie van een evenement › Congres › Wetenschappelijk
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Excellent Surface Passivation of Textured n+-doped Silicon by POx/Al203 Stacks
Roel J. Theeuwes (Spreker)
28 mrt. 2022Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
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Plasma-assisted atomic layer deposition: from basics to applications
W.M.M. (Erwin) Kessels (Spreker)
10 feb. 2021Activiteit: Types gesprekken of presentaties › Keynote spreker › Wetenschappelijk
Knipsels
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The solar tech check: Key takeaways from SiliconPV 2022
1/04/22
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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2D TMD Materials Enabling Future Electronics
Shashank Balasubramanyam, Marc J.M. Merkx, Marcel A. Verheijen, W.M.M. (Erwin) Kessels, Adrie J.M. Mackus & Ageeth A. Bol
27/06/21
1 Mediabijdrage
Pers / media: Vakinhoudelijk commentaar
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-Eindhoven University of Technology: Dutch Academy rewards Eindhoven scientists for their efforts in science communication
Bart Macco, Auke E. Hoekstra, Heleen C. de Coninck & Anna J. Wieczorek
26/04/21
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
Impacts
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Advanced ALD technologies
M. (Adriana) Creatore (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker) & Adrie J.M. Mackus (Onderzoeker)
Impact: Research Topic/Theme (at group level)
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CO2 neutral fuels
Richard A.H. Engeln (Onderzoeker) & W.M.M. (Erwin) Kessels (Onderzoeker)
Impact: Research Topic/Theme (at group level)
Scripties/Masterproeven
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µ-Plasma assisted deposition of titanium dioxide thin films
Auteur: Verheyen, J., 2017Begeleider: Creatore, M. (Afstudeerdocent 1), Aghaee, M. (Afstudeerdocent 2) & Stevens, A. A. E. (Externe coach)
Scriptie/Masterproef: Master
Bestand -
Ab-initio insights into the tunability of the electronic structure in transition metal dichalcogenide alloys grown by atomic layer deposition
Auteur: Schulpen, J. J. P. M., 2018Begeleider: Vandalon, V. (Afstudeerdocent 1) & Bol, A. A. (Afstudeerdocent 2)
Scriptie/Masterproef: Master
Bestand -
Adding H2O to CO2 in a dielectric-barrier discharge
Auteur: Rompelberg, R. M. H., 2017Begeleider: Engeln, R. A. H. (Afstudeerdocent 1), Klarenaar, B. L. M. (Afstudeerdocent 2) & Damen, M. A. (Afstudeerdocent 2)
Scriptie/Masterproef: Bachelor
Bestand