• P.O. Box 513, Flux

    5600 MB Eindhoven

    Nederland

  • Groene Loper 19, Flux

    5612 AP Eindhoven

    Nederland

Organisatieprofiel

Introductie / missie

Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.

Highlighted phrase

We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics

Over de organisatie

We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.

The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.

The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.

The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as  (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.

Vingerafdruk Duik in de onderzoeksthema's waar Plasma & Materials Processing actief is. Deze onderwerplabels komen voort uit het werk van deze leden van de organisatie. Samen vormen ze een unieke vingerafdruk.

Atomic layer deposition Engineering en materiaalwetenschappen
atomic layer epitaxy Fysica en Astronomie
Plasmas Engineering en materiaalwetenschappen
passivity Fysica en Astronomie
solar cells Fysica en Astronomie
Silicon Chemische stoffen
Passivation Engineering en materiaalwetenschappen
Solar cells Engineering en materiaalwetenschappen

Netwerk Recente externe samenwerking op landenniveau. Duik in de details door op de stippen te klikken.

Onderzoeksoutput 1965 2020

Atomic layer deposition
atomic layer epitaxy
Doping (additives)
Annealing
annealing

Exploring voltage mediated delamination of suspended 2D materials as a cause of commonly observed breakdown

Loessberg-Zahl, J., De Bruijn, D. S., van den Beld, W. T. E., Dollekamp, E., Grady, E., Keerthi, A., Bomer, J., Radha, B., Zandvliet, H. J. W., Bol, A. A., van den Berg, A. & Eijkel, J. C. T., 9 jan 2020, In : Journal of Physical Chemistry C. 124, 1, blz. 430-435 6 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Graphite
Delamination
Graphene
graphene
breakdown

Hard superconducting gap and diffusion-induced superconductors in Ge-Si nanowires

Ridderbos, J., Brauns, M., de Vries, F. K., Shen, J., Li, A., Kölling, S., Verheijen, M. A., Brinkman, A., van der Wiel, W. G., Bakkers, E. P. A. M. & Zwanenburg, F. A., 8 jan 2020, In : Nano Letters. 20, 1, blz. 122-130 9 blz.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Open Access
Bestand
Superconducting materials
Nanowires
nanowires
Magnetic fields
critical temperature

Uitrusting

ALD

J.J.M. Sanders (Manager)

Plasma & Materials Processing

Uitrusting/faciliteit: Uitrusting

Atomic layer deposition
Chemical vapor deposition
Monolayers
Molecules
Surface reactions

Chemical Vapor Deposition

J.J.M. Sanders (Manager)

Plasma & Materials Processing

Uitrusting/faciliteit: Uitrusting

Chemical vapor deposition
Substrates
Plasma enhanced chemical vapor deposition
Byproducts
Flow of gases

Prijzen

2nd prize student award competition

Bart Macco (Ontvanger), 26 jul 2016

Prijs: AndersWerk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.)Wetenschappelijk

ALD Best Student Paper Award

Martijn Vos (Ontvanger), 23 jul 2019

Prijs: AndersWerk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.)Wetenschappelijk

ALD Innovator Award

Erwin Kessels (Ontvanger), 22 jul 2019

Prijs: AndersWerk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.)Wetenschappelijk

Activiteiten 1995 2018

  • 76 Aangemelde presentatie
  • 15 Genodigd spreker
  • 12 Redactioneel werk

New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide

A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Spreker)
30 sep 20184 okt 2018

Activiteit: Types gesprekken of presentatiesAangemelde presentatieWetenschappelijk

Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma

A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Uitgenodigde spreker)
24 jul 201828 jul 2018

Activiteit: Types gesprekken of presentatiesGenodigd sprekerWetenschappelijk

Overview of approaches for achieving area-selective ALD

A.J.M. Mackus (Uitgenodigde spreker)
29 apr 20181 mei 2018

Activiteit: Types gesprekken of presentatiesGenodigd sprekerWetenschappelijk

Impacts

Advanced ALD technologies

M. (Adriana) Creatore (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker), Adrie J.M. Mackus (Onderzoeker)

Impact: Research Topic/Theme (at group level)

ALD for energy

M. (Adriana) Creatore (Onderzoeker)

Impact: Research Topic/Theme (at group level)

CO2 neutral fuels

Richard A.H. Engeln (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker)

Impact: Research Topic/Theme (at group level)

Scripties/masterproeven

Magneetveldgeneratie in plasma's : spectroscopische metingen aan een expanderend cascadeboogplasma

Auteur: Bollen, G., 31 dec 1988

Begeleider: Gielen, H. (Afstudeerdocent 1) & Schram, D. (Afstudeerdocent 2)

Scriptie/masterproef: Master

Bestand