Onderzoeksoutput per jaar
Organisatieprofiel
Introductie / missie
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Over de organisatie
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
Vingerafdruk Verdiep u in de onderzoeksgebieden waarop Plasma & Materials Processing actief is. Deze onderwerplabels komen uit het werk van de leden van deze organisatie. Samen vormen ze een unieke vingerafdruk.
Netwerk
Recente externe samenwerking op landenniveau. Duik in de details door op de stippen te klikken.
Profielen
Karsten Arts, MSc
- Faculteit Technische Natuurkunde, Plasma & Materials Processing - Promovendus
Persoon: Prom. : Promovendus
Saravana Balaji Basuvalingam
- Faculteit Technische Natuurkunde, Plasma & Materials Processing - Promovendus
Persoon: Prom. : Promovendus
Onderzoeksoutput
Atomic layer deposition of aluminum phosphate using AlMe3, PO(OMe)3 and O2 plasma: film growth and surface reactions
Hornsveld, N., Kessels, W. M. M. E. & Creatore, M. A., 5 mrt 2020, In : Journal of Physical Chemistry C. 124, 9, blz. 5495-5505 11 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open Access
Bestand
Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
Di Palma, V., Knoops, H. C. M., Kessels, W. M. M. E. & Creatore, M. A., 1 mrt 2020, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 38, 2, 10 blz., 022416.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Atomic layer deposition of Nb-doped TiO2: dopant incorporation and effect of annealing
Berghuis, W-J. H., Melskens, J., Macco, B., Basuvalingam, S. B., Verheijen, M. A. & Kessels, W. M. M. E., 1 mrt 2020, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 38, 2, 9 blz., 022408.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Uitrusting
Ceramic Cascade Arch
M.C.M. (Richard) van de Sanden (Manager)
Plasma & Materials ProcessingUitrusting/faciliteit: Uitrusting
Chemical Vapor Deposition
J.J.M. Sanders (Manager)
Plasma & Materials ProcessingUitrusting/faciliteit: Uitrusting
Prijzen
2nd prize student award competition
Bart Macco (Ontvanger), 26 jul 2016
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
ALD Best Student Paper Award
Martijn Vos (Ontvanger), 23 jul 2019
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
ALD Innovator Award
Erwin Kessels (Ontvanger), 22 jul 2019
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
Activiteiten
New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Spreker)30 sep 2018 → 4 okt 2018
Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma
A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Uitgenodigde spreker)24 jul 2018 → 28 jul 2018
Activiteit: Types gesprekken of presentaties › Genodigd spreker › Wetenschappelijk
Overview of approaches for achieving area-selective ALD
A.J.M. Mackus (Uitgenodigde spreker)29 apr 2018 → 1 mei 2018
Activiteit: Types gesprekken of presentaties › Genodigd spreker › Wetenschappelijk
Knipsels
Better thermal conductivity by adjusting the arrangement of atoms
Erik P.A.M. Bakkers, Marcel A. Verheijen & Sebastian Kölling
19/07/19 → 22/07/19
2 items van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
University of Basel: Better Thermal Conductivity By Adjusting the Arrangement of Atoms
Erik P.A.M. Bakkers & Marcel A. Verheijen
19/07/19
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
Impacts
Advanced ALD technologies
M. (Adriana) Creatore (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker), Adrie Mackus (Onderzoeker)
Impact: Research Topic/Theme (at group level)
CO2 neutral fuels
Richard A.H. Engeln (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker)
Impact: Research Topic/Theme (at group level)
Scripties/Masterproeven
µ-Plasma assisted deposition of titanium dioxide thin films
Auteur: Verheyen, J., 2017Begeleider: Creatore, M. (. (Afstudeerdocent 1), Aghaee, M. (Afstudeerdocent 2) & Stevens, A. A. (Externe coach)
Scriptie/masterproef: Master
Bestand
3CBX0: surface reactions during atomic layer deposition of cobalt phosphate
Auteur: Raaijmakers, S., 2019Begeleider: Creatore, M. (. (Afstudeerdocent 1) & Di Palma, V. (Afstudeerdocent 2)
Scriptie/masterproef: Bachelor
Bestand
Ab-initio insights into the tunability of the electronic structure in transition metal dichalcogenide alloys grown by atomic layer deposition
Auteur: Schulpen, J. J., 2018Begeleider: Vandalon, V. (Afstudeerdocent 1) & Bol, A. A. (Afstudeerdocent 2)
Scriptie/masterproef: Master
Bestand