Onderzoeksoutput per jaar
Organisatieprofiel
Introductie / missie
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Over de organisatie
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
Netwerk
Recente externe samenwerking op landenniveau. Duik in de details door op de stippen te klikken.
Profielen
Morteza Aghaee
- Faculteit Technische Natuurkunde, Plasma & Materials Processing - ex Promovendus
Persoon: Onbekend
Karsten Arts, MSc
- Faculteit Technische Natuurkunde, Plasma & Materials Processing - Promovendus
Persoon: Prom. : Promovendus
Shashank Balasubramanyam
- Faculteit Technische Natuurkunde, Plasma & Materials Processing - Promovendus
Persoon: Prom. : Promovendus
Onderzoeksoutput 1965 2019
21.6%-efficient monolithic perovskite/Cu(In,Ga)Se2 tandem solar cells with thin conformal hole transport layers for integration on rough bottom bell surfaces
Jošt, M., Bertram, T., Koushik, D., Marquez, J. A., Verheijen, M. A., Heinemann, M. D., Köhnen, E., Al-Ashouri, A., Braunger, S., Lang, F., Rech, B., Unold, T., Creatore, M., Lauermann, I., Kaufmann, C. A., Schlatmann, R. & Albrecht, S., 24 jan 2019, In : ACS Energy Letters. 4, blz. 583-590 8 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Perovskite
Solar cells
Conversion efficiency
Volatile organic compounds
Atomic layer deposition
Area-selective atomic layer deposition of ZnO by area activation using electron beam-induced deposition
Mameli, A., Karasulu, B., Verheijen, M., Barcones Campo, B., Macco, B., Mackus, A., Kessels, E. & Roozeboom, F., 31 jan 2019, In : Chemistry of Materials. 31, 4, blz. 1250-1257Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open Access
Bestand
Atomic layer deposition
Electron beams
Chemical activation
Density functional theory
Temperature
Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching
Vos, M. F. J., Chopra, S. N., Verheijen, M. A., Ekerdt, J. G., Agarwal, S., Kessels, W. M. M. & Mackus, A. J. M., 22 mei 2019, In : Chemistry of Materials. 31, 11, blz. 3878-3882Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open Access
Bestand
Uitrusting
Atomic layer deposition
Chemical vapor deposition
Monolayers
Molecules
Surface reactions
Ceramic Cascade Arch
Richard van de Sanden (Manager)
Plasma & Materials ProcessingUitrusting/faciliteit: Uitrusting
Chemical Vapor Deposition
J.J.M. Sanders (Manager)
Plasma & Materials ProcessingUitrusting/faciliteit: Uitrusting
Chemical vapor deposition
Substrates
Plasma enhanced chemical vapor deposition
Byproducts
Flow of gases
Prijzen
2nd prize student award competition
Bart Macco (Ontvanger), 26 jul 2016
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
ALD Best Student Paper Award
Martijn Vos (Ontvanger), 23 jul 2019
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
ALD Innovator Award
Erwin Kessels (Ontvanger), 22 jul 2019
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
Activiteiten 1995 2018
New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Spreker)30 sep 2018 → 4 okt 2018
Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma
A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Uitgenodigde spreker)24 jul 2018 → 28 jul 2018
Activiteit: Types gesprekken of presentaties › Genodigd spreker › Wetenschappelijk
Overview of approaches for achieving area-selective ALD
A.J.M. Mackus (Uitgenodigde spreker)29 apr 2018 → 1 mei 2018
Activiteit: Types gesprekken of presentaties › Genodigd spreker › Wetenschappelijk
Pers/media
WIPO PUBLISHES PATENT OF TECHNISCHE UNIVERSITEIT EINDHOVEN FOR "PEROVSKITE CONTACTING PASSIVATING BARRIER LAYER FOR SOLAR CELLS" (DUTCH INVENTORS)
Adriana Creatore & Dibyashree Koushik
14/01/18
1 item van media-aandacht
Pers / media: Vakinhoudelijk commentaar
Nano-hashtags could provide definite proof of Majorana particles - crucial step towards quantum computer ...
Erik Bakkers, Marcel Verheijen, Sasa Gazibegovic & Roy Op het Veld
29/08/17
1 item van media-aandacht
Pers / media: Vakinhoudelijk commentaar
'Nano-hashtags' could provide definite proof of Majorana particles
Erik Bakkers, Marcel Verheijen, Roy Op het Veld & Sasa Gazibegovic
23/08/17 → 28/08/17
6 items van media-aandacht
Pers / media: Vakinhoudelijk commentaar
Impacts
Advanced ALD technologies
ALD for energy
CO2 neutral fuels
Scripties/masterproeven
Magneetveldgeneratie in plasma's : spectroscopische metingen aan een expanderend cascadeboogplasma
Auteur: Bollen, G., 31 dec 1988Begeleider: Gielen, H. (Afstudeerdocent 1) & Schram, D. (Afstudeerdocent 2)
Scriptie/masterproef: Master
Bestand
Tuning the electronic structure of 2D materials through defectivity and alloying: A combined experimental and theoretical study
Auteur: Schulpen, J., 9 nov 2018Scriptie/masterproef: Master