• P.O. Box 513, Flux

    5600 MB Eindhoven

    Nederland

  • Groene Loper 19, Flux

    5612 AP Eindhoven

    Nederland

Organisatieprofiel

Introductie / missie

Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.

Highlighted phrase

We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics

Over de organisatie

We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.

The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.

The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.

The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as  (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.

Vingerafdruk Verdiep u in de onderzoeksgebieden waarop Plasma & Materials Processing actief is. Deze onderwerplabels komen uit het werk van de leden van deze organisatie. Samen vormen ze een unieke vingerafdruk.

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    Onderzoeksoutput

    Atomic layer deposition of aluminum phosphate using AlMe3, PO(OMe)3 and O2 plasma: film growth and surface reactions

    Hornsveld, N., Kessels, W. M. M. E. & Creatore, M. A., 5 mrt 2020, In : Journal of Physical Chemistry C. 124, 9, blz. 5495-5505 11 blz.

    Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

    Open Access
    Bestand
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  • Uitrusting

    ALD

    J.J.M. Sanders (Manager)

    Plasma & Materials Processing

    Uitrusting/faciliteit: Uitrusting

  • Chemical Vapor Deposition

    J.J.M. Sanders (Manager)

    Plasma & Materials Processing

    Uitrusting/faciliteit: Uitrusting

  • Prijzen

    2nd prize student award competition

    Bart Macco (Ontvanger), 26 jul 2016

    Prijs: AndersWerk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.)Wetenschappelijk

    ALD Best Student Paper Award

    Martijn Vos (Ontvanger), 23 jul 2019

    Prijs: AndersWerk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.)Wetenschappelijk

    ALD Innovator Award

    Erwin Kessels (Ontvanger), 22 jul 2019

    Prijs: AndersWerk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.)Wetenschappelijk

    Activiteiten

    • 76 Aangemelde presentatie
    • 15 Genodigd spreker
    • 12 Redactioneel werk

    New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide

    A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Spreker)
    30 sep 20184 okt 2018

    Activiteit: Types gesprekken of presentatiesAangemelde presentatieWetenschappelijk

    Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma

    A. Mameli (Deelnemer), M.A. Verheijen (Deelnemer), B. Karasulu (Deelnemer), A.J.M. Mackus (Deelnemer), W.M.M. Kessels (Deelnemer), F. Roozeboom (Uitgenodigde spreker)
    24 jul 201828 jul 2018

    Activiteit: Types gesprekken of presentatiesGenodigd sprekerWetenschappelijk

    Overview of approaches for achieving area-selective ALD

    A.J.M. Mackus (Uitgenodigde spreker)
    29 apr 20181 mei 2018

    Activiteit: Types gesprekken of presentatiesGenodigd sprekerWetenschappelijk

    Knipsels

    Manufacturing Bits: Feb. 18

    Karsten Arts

    18/02/20

    1 item van Media-aandacht

    Pers / media: Vakinhoudelijk commentaar

    Better thermal conductivity by adjusting the arrangement of atoms

    Erik P.A.M. Bakkers, Marcel A. Verheijen & Sebastian Kölling

    19/07/1922/07/19

    2 items van Media-aandacht

    Pers / media: Vakinhoudelijk commentaar

    Impacts

    Advanced ALD technologies

    M. (Adriana) Creatore (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker), Adrie Mackus (Onderzoeker)

    Impact: Research Topic/Theme (at group level)

    ALD for energy

    M. (Adriana) Creatore (Onderzoeker)

    Impact: Research Topic/Theme (at group level)

    CO2 neutral fuels

    Richard A.H. Engeln (Onderzoeker), W.M.M. (Erwin) Kessels (Onderzoeker)

    Impact: Research Topic/Theme (at group level)

    Scripties/Masterproeven

    µ-Plasma assisted deposition of titanium dioxide thin films

    Auteur: Verheyen, J., 2017

    Begeleider: Creatore, M. (. (Afstudeerdocent 1), Aghaee, M. (Afstudeerdocent 2) & Stevens, A. A. (Externe coach)

    Scriptie/masterproef: Master

    Bestand

    3CBX0: surface reactions during atomic layer deposition of cobalt phosphate

    Auteur: Raaijmakers, S., 2019

    Begeleider: Creatore, M. (. (Afstudeerdocent 1) & Di Palma, V. (Afstudeerdocent 2)

    Scriptie/masterproef: Bachelor

    Bestand