NanoLab@TU/e

Organisatieprofiel

Introductie / missie

The NanoLab@TU/e is a world-class facility for fundamental research. It plays an important role in the research carried out at Eindhoven University of Technology (TU/e) and supports nanotechnology research and innovation throughout the Netherlands.

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With its extensive laboratory facilities, the NanoLab@TU/e offers a wide spectrum of opportunities for research and development activities

Over de organisatie

The NanoLab@TU/e hosts both elite academic research and a multitude of industrial collaborations. It is an open-access research laboratory, available to TU/e, other research centers and industrial partners. This approach helps fundamental research insights quickly find their way into industry. Some examples of the fundamental research topics in the NanoLab@TU/e: nanowires, single-photon emitters, photonic integrated circuits and the fabrication of ultrathin layers with top-of-the-line atomic layer deposition equipment.

Unique cleanroom expertise

The NanoLab@TU/e facilities include an 800 m2 fully equipped cleanroom (ISO class 6) with state-of-the-art equipment. Within that cleanroom, there is a separate lithography section. Unique in the Netherlands and even the world, the NanoLab@TU/e has an ASML scanner to produce features as small as 100 nm on 3-inch indium phosphide wafers. In addition, the NanoLab@TU/e also has expert functions in processing of III/V semiconductors and especially in epitaxial growth of the materials.

Additional facilities and support

Additional labs hold scanning electron microscopes and nano-prototyping and bonding equipment. A wide range of atomic layer deposition equipment is also available.

A staff of professional engineers and experts offers skillful technical support. NanoLab@TU/e is located at the TU/e Campus in the center of Eindhoven and is easily accessible either by car or public transport.

Vingerafdruk Verdiep u in de onderzoeksgebieden waarop NanoLab@TU/e actief is. Deze onderwerplabels komen uit het werk van de leden van deze organisatie. Samen vormen ze een unieke vingerafdruk.

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    Profielen

    Foto van Jeroen Bolk

    Jeroen Bolk

    Persoon: OBP : Ondersteunend en Beheerspersoneel

    20102020
    Geen foto van Frank W.A. Dirne

    Frank W.A. Dirne

    Persoon: OBP : Ondersteunend en Beheerspersoneel

    19861995
    Geen foto van Niall Kelly

    Niall Kelly

    Persoon: OWP : Docent / Onderzoeker

    20192019

    Onderzoeksoutput

    ArF scanner lithography for InP photonic integrated circuit fabrication

    Bolk, J., 12 mei 2020, (Geaccepteerd/In druk) Eindhoven: Technische Universiteit Eindhoven.

    Onderzoeksoutput: Scriptie › Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)

    Extraction of Dzyaloshinskii-Moriya interaction from propagating spin waves

    Lucassen, J., Schippers, C. F., Verheijen, M. A., Fritsch, P., Geluk, E. J., Barcones Campo, B., Duine, R. A., Wurmehl, S., Swagten, H. J. M., Koopmans, B. & Lavrijsen, R., 28 feb 2020, In : Physical Review B. 101, 6, 6 blz., 064432.

    Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

    Indium phosphide membrane nanophotonic integrated circuits on silicon

    Jiao, Y., van der Tol, J., Pogoretskii, V., van Engelen, J., Kashi, A. A., Reniers, S., Wang, Y., Zhao, X., Yao, W., Liu, T., Pagliano, F., Fiore, A., Zhang, X., Cao, Z., Kumar, R. R., Tsang, H. K., van Veldhoven, R., de Vries, T., Geluk, E. J., Bolk, J. & 3 anderen, Ambrosius, H., Smit, M. & Williams, K., 1 feb 2020, In : Physica Status Solidi (A) Applications and Materials Science. 217, 3, 12 blz., 1900606.

    Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

    Open Access
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