Projecten per jaar
Organisatieprofiel
Introductie / missie
This Lab focusses on control techniques in lithographic scanners, in particular related to high-accuracy positioning systems.
Over de organisatie
A distinction can be made based on motion range (“long” indicating meter-scale, “short” indicating mm scale), and accuracy (micrometer or sub-nanometer). Long-range actuators typically have a moderate accuracy but suffer from nonlinearities like friction, requiring compensation methods using adaptive or learning techniques. Nonlinearities also play a role when using piezo materials for actuation in high-accuracy applications, possibly simultaneously with using the material as sensor (“self-sensing”). Finally, control techniques to improve sub-nanometer positioning systems have to deal with position dependency, in particular in the observation of dynamic modes in the measurement system. This has led to position-dependent observers creating the option of increasing control bandwidth.
Vingerafdruk
Netwerk
Profielen
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Clarisse Bosman Barros, MSc
- Electrical Engineering, Control of High-Precision Mechatronic Systems Lab
- Electrical Engineering, Machine Learning for Modelling and Control
- Electrical Engineering, Control Systems - Promovendus
Persoon: Prom. : Promovendus, Prom. : Promovendus
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Hans Butler
- Electrical Engineering, Control Systems - Hoogleraar
- Electrical Engineering, Control of High-Precision Mechatronic Systems Lab
Persoon: HGL : Hoogleraar
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Roland Tóth
- Electrical Engineering, Control of High-Precision Mechatronic Systems Lab
- Electrical Engineering, Machine Learning for Modelling and Control
- Electrical Engineering, Autonomous Motion Control (AMC) Lab
- Electrical Engineering, Control Systems - Universitair Hoofddocent
- EAISI High Tech Systems - Universitair Hoofddocent
Persoon: UHD : Universitair Hoofddocent
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AquaConnect, key technologies for safeguarding regional water provision in fresh water stressed deltas
Goswami, D., Voeten, J. P. M., Verheijen, P. C. N., Lazar, M., de Mol-Regels, M., van der Hagen, D. & Haghi, M.
15/09/21 → 31/08/25
Project: Onderzoek direct
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TKI-HTSM PPS-toeslag Advanced piezo-electric water stage for next generation lithography and metrology application - ASML project 2: Control architecture and design for a piezo-electric wafer stage
Van den Hof, P. M. J., Bosman Barros, C., Nawijn, H., van der Hagen, D. & Tóth, R.
1/01/18 → 30/11/25
Project: Onderzoek direct
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ERC Grant R. Toth (APROCS)
Tóth, R., Tóth, R., Schoukens, M., Bloemers, T. A. H., Koelewijn, P. J. W., Nawijn, H., Iacob, L. C. & van der Hagen, D.
1/09/17 → 31/03/23
Project: Onderzoek direct
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Advancing Process Control using Orthonormal Basis Functions
Bachnas, A. A., 16 feb. 2023, Eindhoven: Eindhoven University of Technology. 213 blz.Onderzoeksoutput: Scriptie › Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)
Open AccessBestand -
Analysis and Control of Nonlinear Systems with Stability and Performance Guarantees: A Linear Parameter-Varying Approach
Koelewijn, P. J. W., 15 feb. 2023, Eindhoven: Eindhoven University of Technology. 373 blz.Onderzoeksoutput: Scriptie › Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)
Open AccessBestand -
Convex incremental dissipativity analysis of nonlinear systems
Verhoek, C., Koelewijn, P. J. W., Haesaert, S. & Tóth, R., 1 apr. 2023, In: Automatica. 150, 10 blz., 110859.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand16 Downloads (Pure)
Prijzen
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Best Student Paper Award IFAC CAO 2022
Bolderman, Max (Ontvanger), Fan, Daiwei (Ontvanger), Lazar, Mircea (Ontvanger) & Butler, Hans (Ontvanger), 2022
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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Journal of Process Control Paper Prize Award 2020-Survey Category
Saltik, M.B. (Bahadir) (Ontvanger), Özkan, Leyla (Ontvanger), Ludlage, Jobert H.A. (Ontvanger), Weiland, Siep (Ontvanger) & Van den Hof, Paul M.J. (Ontvanger), 2020
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
Knipsels
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US Patent Issued to ASML Netherlands on March 21 for "Lithographic apparatus" (Dutch Inventors)
22/03/23
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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Advancing control engineering methods to meet current and future challenges
16/02/23
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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US Patent Issued to ASML Netherlands on Jan. 24 for "Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method" (Dutch Inventors)
25/01/23
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
Scripties/Masterproeven
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Active damping for charge driven piezoelectric nanopositioning stage using self sensing control
Auteur: Di Filippo, R., 19 sep. 2018Begeleider: Weiland, S. (Afstudeerdocent 1), Butler, H. (Afstudeerdocent 2), Jansen, B. (Externe coach) & Vandervelden, R. (Externe persoon) (Externe coach)
Scriptie/Masterproef: Master
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Adaptive friction compensation for an industrial coreless linear motor setup
Auteur: van den Boom, P. W. M., 13 dec. 2018Begeleider: Nguyen, T. (Afstudeerdocent 1), Lazar, M. (Afstudeerdocent 2) & Butler, H. (Afstudeerdocent 2)
Scriptie/Masterproef: Master
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Adaptive port-Hamiltonian discretization of distributed parameter systems
Auteur: Meijer, T., 25 okt. 2018Begeleider: Weiland, S. (Afstudeerdocent 1) & van den Hurk, D. (Afstudeerdocent 2)
Scriptie/Masterproef: Master