We aim to develop advanced atomic layer deposition and etching processes through in-depth understanding of the underlying reaction mechanisms. With this we try to enable future device technologies in nanoelectronics, photonics, photovoltaics and beyond. 

Atomic scale processing for future device technologies

Whether it is in the field of nanoelectronics, photonics, photovoltaics or quantum technology, future device technologies will heavily depend on atomic scale processing techniques such as atomic layer deposition (ALD) and atomic layer etching (ALE). These techniques allow for atomic-scale control and they provide many opportunities for bottom-up processing of the multitude of materials that will make up future devices. With our research we try to develop advanced processes that will enable these future device technologies. Current interests include thermal and plasma-assisted ALD and ALE processes as well as area- and topographically-selective processing. Very importantly, it also involves fundamental studies of the underlying reaction mechanisms through advanced in situ studies coupled to atomistic modelling. Our direct research partners are mostly equipment manufacturers and suppliers of chemicals.