Projecten per jaar
Organisatieprofiel
Introductie / missie
We aim to develop advanced atomic layer deposition and etching processes through in-depth understanding of the underlying reaction mechanisms. With this we try to enable future device technologies in nanoelectronics, photonics, photovoltaics and beyond.
Highlighted phrase
Atomic scale processing for future device technologies
Over de organisatie
Whether it is in the field of nanoelectronics, photonics, photovoltaics or quantum technology, future device technologies will heavily depend on atomic scale processing techniques such as atomic layer deposition (ALD) and atomic layer etching (ALE). These techniques allow for atomic-scale control and they provide many opportunities for bottom-up processing of the multitude of materials that will make up future devices. With our research we try to develop advanced processes that will enable these future device technologies. Current interests include thermal and plasma-assisted ALD and ALE processes as well as area- and topographically-selective processing. Very importantly, it also involves fundamental studies of the underlying reaction mechanisms through advanced in situ studies coupled to atomistic modelling. Our direct research partners are mostly equipment manufacturers and suppliers of chemicals.
Vingerafdruk
Netwerk
Profielen
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Willem-Jan H. Berghuis, MSc
- Applied Physics and Science Education, Atomic scale processing
- Applied Physics and Science Education, Plasma & Materials Processing - Postdoc
Persoon: Prom. : Promovendus, PD : Postdoc
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Harm C.M. Knoops
- EIRES Chem. for Sustainable Energy Systems - Universitair Docent
- Applied Physics and Science Education, Plasma & Materials Processing - Universitair Docent
- Applied Physics and Science Education, Atomic scale processing
Persoon: UD : Universitair Docent
projecten
- 3 Afgelopen
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Metal Oxides: Maturing of an Efficient Novel Technology Upgrade for PV-Manufacturing
Kessels, W. M. M., Koushik, D. & Theeuwes, R. J.
1/02/20 → 30/06/22
Project: Onderzoek direct
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BRIGHT TKI toeslag
Kessels, W. M. M., Macco, B., Faraz, T. & Koushik, D.
1/08/18 → 31/05/21
Project: Onderzoek direct
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3DAM
Kessels, W. M. M., Vandalon, V., van Bommel, C., Shirazi, M., Faraz, T. & Schulpen, J. J. P. M.
1/04/16 → 1/04/19
Project: Onderzoek direct
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Ceria-Supported Cobalt Catalyst for Low-Temperature Methanation at Low Partial Pressures of CO2
Struijs, J. J. C., Muravev, V., Verheijen, M. A., Hensen, E. J. M. & Kosinov, N., 26 jan. 2023, In: Angewandte Chemie - International Edition. 62, 5, 9 blz., e202214864.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand3 Downloads (Pure) -
Alumina-Supported NiMo Hydrotreating CatalystsAspects of 3D Structure, Synthesis, and Activity
Li, M., Ihli, J., Verheijen, M. A., Holler, M., Guizar-Sicairos, M., van Bokhoven, J. A., Hensen, E. J. M. & Weber, T., 3 nov. 2022, In: Journal of Physical Chemistry C. 126, 43, blz. 18536-18549 14 blz.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
Open AccessBestand15 Downloads (Pure) -
Area-selective atomic layer deposition using small molecule inhibitors
Merkx, M. J. M., 22 feb. 2022, Eindhoven: Eindhoven University of Technology. 234 blz.Onderzoeksoutput: Scriptie › Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)
Datasets
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Data for: On the Hydrogenation of Poly-Si Passivating Contacts by Al2O3 and SiNx Thin Films
Macco, B. (Bijdrager), Mendeley Data, 2020
DOI: 10.17632/fm4225kzfh.1, https://data.mendeley.com/datasets/fm4225kzfh
Dataset
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Dataset for "Unveiling Planar Defects in Hexagonal Group IV Materials "
Fadaly, E. (Ontwerper), Marzegalli, A. (Ontwerper), Ren, Y. (Ontwerper), Dijkstra, A. (Ontwerper), De Matteis, D. (Bijdrager), Scalise, E. (Ontwerper), Sarikov, A. (Ontwerper), De Luca, M. (Ontwerper), Rurali, R. (Ontwerper), Zardo, I. (Ontwerper), Haverkort, J. E. M. (Ontwerper), Botti, S. (Ontwerper), Miglio, L. (Ontwerper), Bakkers, E. P. A. M. (Ontwerper) & Verheijen, M. A. (Ontwerper), 4TU.Centre for Research Data, 30 jun. 2021
DOI: 10.4121/14846988
Dataset
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Growth - related formation mechanism of I3 - type basal stacking fault in epitaxially grown hexagonal Ge - 2H
Vincent, L. (Ontwerper), Fadaly, E. (Ontwerper), Renard, C. (Ontwerper), Peeters, W. H. J. (Ontwerper), Vettori, M. (Ontwerper), Panciera, F. (Ontwerper), Bouchier, D. (Ontwerper), Bakkers, E. P. A. M. (Ontwerper) & Verheijen, M. A. (Ontwerper), Zenodo, 30 okt. 2021
Dataset
Prijzen
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Best ALD paper Award
Knoops, Harm (Ontvanger), 7 jul. 2022
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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Best Oral Presentation Award of the EN01 Silicon for Photovoltaics symposium
Theeuwes, Roel J. (Ontvanger), 9 mei 2022
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
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SiliconPV Award
Theeuwes, Roel J. (Ontvanger), 30 mrt. 2022
Prijs: Anders › Werk, activiteit of publicatie gerelateerde prijzen (lifetime, best paper, poster etc.) › Wetenschappelijk
Activiteiten
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POx/Al2O3 stacks for surface passivation of Si and InP
Roel J. Theeuwes (Spreker)
10 mei 2022Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
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Excellent Surface Passivation of n+-doped Silicon by POx/Al2O3 Stacks with High Positive Fixed Charge Density
Roel J. Theeuwes (Spreker)
9 mei 2022Activiteit: Types gesprekken of presentaties › Aangemelde presentatie › Wetenschappelijk
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2022 MRS Spring Meeting & Exhibit, May 8-13, 2022, Honolulu, Hawai'i, May 23-25, 2022, Virtual
Roel J. Theeuwes (Deelnemer)
8 mei 2022 → 13 mei 2022Activiteit: Types deelname aan of organisatie van een evenement › Congres › Wetenschappelijk
Knipsels
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Investigators from Eindhoven University of Technology Release New Data on Atomic Layer Deposition (Surface Smoothing By Atomic Layer Deposition and Etching for the Fabrication of Nanodevices)
Vincent Vandalon, Harm C.M. Knoops, Adriaan J.M. Mackus, Marcel A. Verheijen, Nicholas Chittock & S.H. Gerritsen
3/01/23
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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New Atomic Layer Deposition Data Have Been Reported by Researchers at Eindhoven University of Technology (Atomic Layer Deposition of Conductive and Semiconductive Oxides)
23/12/22
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
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Study Findings from Eindhoven University of Technology Broaden Understanding of Atomic Layer Deposition (Temporal and Spatial Atomic Layer Deposition of Al-doped Zinc Oxide As a Passivating Conductive Contact for Silicon Solar Cells)
B.W.H. van de Loo, Bart Macco, Cristian A.A. van Helvoirt & Nga Phung
5/12/22
1 item van Media-aandacht
Pers / media: Vakinhoudelijk commentaar
Scripties/Masterproeven
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Characterization of Intrinsic and Aluminum-doped ZnO Deposited by Spatial ALD
Auteur: Broekema, T. M. P., 22 sep. 2021Begeleider: Macco, B. (Afstudeerdocent 1), van de Loo, B. W. H. (Externe coach) & Kessels, W. M. M. (Afstudeerdocent 2)
Scriptie/Masterproef: Master
Bestand -
Plasma-Enhanced Atomic Layer Deposition of Superconducting Tantalum Carbonitride for Quantum Devices
Auteur: Peeters, S. A., 2022Begeleider: Knoops, H. C. M. (Afstudeerdocent 1) & Kessels, W. M. M. (Afstudeerdocent 2)
Scriptie/Masterproef: Master
Bestand