Nanomefos

    P.C.J.N. (Nick) Rosielle (Manager)

Uitrusting/faciliteit: Uitrusting

  • Locatie

    Nederland

Uitrustingsdetails

Tekst

Contact-free measuring machine for aspherical and freeform optics in optical systems. The measuring machine consists of three subsystems: the motion system, the contact-free scanning probe and a measuring loop. A special contact-free scanning probe developed within the project scans the surface. This contact-free scanning probe has a range of 5 millimeters and nanometer accuracy. To prevent a long measuring loop and corresponding measurement errors, a special metrology frame is added and the position of the scanning probe relative to that frame is measured interferometrically. The motion guidance consists of air bearings and is adjusted by linear motors using a Dspace system.

Details

NaamNanomefos
FabrikantenEquipment & Prototype Center

Vingerafdruk Verken de onderzoeksgebieden waarvoor deze uitrusting is gebruikt. Deze labels worden gegenereerd op basis van de gerelateerde outputs. Samen vormen ze een unieke vingerafdruk.

  • Onderzoeksoutput

    • 9 Conferentiebijdrage
    • 1 Rapport
    • 1 Octrooi-publicatie
    • 1 Dissertatie 1 (Onderzoek TU/e / Promotie TU/e)

    Development and performance demonstration of the NANOMEFOS non-contact measurement machine for freeform optics

    Henselmans, R., Cacace, L. A., Kramer, G. F. IJ., Rosielle, P. C. J. N. & Steinbuch, M., 2009, Proceedings of the 9th Euspen International Conference and 11th Annual General Meeting, 2-5 June 2009, San Sebastian, Spain. Spain, San Sebastian, blz. 164-168

    Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

    Open Access
    Bestand
  • 1 Citaat (Scopus)
    52 Downloads (Pure)

    Freeform optics measurements with the NANOMEFOS non-contact measurement machine

    Henselmans, R., Cacace, L. A., Kramer, G. F. IJ., Rosielle, P. C. J. N. & Steinbuch, M., 2009, Proceedings of the SPIE Optifab 2009, 11-14 May 2009, Rochester, NY, USA. United States, Rochester, NY

    Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

    Open Access
    Bestand
  • 130 Downloads (Pure)

    Nanometer level freeform surface measurements with the NANOMEFOS non-contact measurement machine

    Henselmans, R., Cacace, L. A., Kramer, G. F. IJ., Rosielle, P. C. J. N. & Steinbuch, M., 2009, Optical Manufacturing and Testing VIII, 4–5 August 2009, San Diego, CA, USA. Burge, J. H., Fähnle, O. W. & Williamson, R. (redactie). SPIE, blz. 742606-1/11 (Proceedings of SPIE; vol. 7426).

    Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

  • 6 Citaten (Scopus)