US Patent Issued to ASML Netherlands on March 30 for "Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method" (Dutch Inventors)

Media-aandacht

• Titel	US Patent Issued to ASML Netherlands on March 30 for "Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method" (Dutch Inventors)
  Media naam/outlet	US Fed News
  Land/Regio	Verenigde Staten van Amerika
  Release datum	5/04/21
  Personen	Hans Butler